Horizontal emitting, vertical emitting, beam shaped, distributed feedback (DFB) lasers fabricated by growth over a patterned substrate with multiple overgrowth
First Claim
1. A structure using integrated optical elements, comprising:
- (a) a substrate;
(b) a buffer layer grown on the substrate;
(c) one or more first patterned layers deposited on top of the buffer layer, wherein each of the first patterned layers is comprised of a bottom lateral epitaxial overgrowth (LEO) mask layer and a first LEO nitride layer filling holes in the bottom LEO mask layer;
(d) one or more active layers formed on the first patterned layers; and
(e) one or more second patterned layers deposited on top of the active layer, wherein each of the second patterned layers is comprised of a top LEO mask layer and a second LEO nitride layer filling holes in the top LEO mask layer;
(f) wherein the top, bottom, or top and bottom LEO mask layers, act as a mirror, optical confinement layer, grating, wavelength selective element, beam shaping element or beam directing element for the active layers.
2 Assignments
0 Petitions
Accused Products
Abstract
A structure using integrated optical elements is comprised of a substrate, a buffer layer grown on the substrate, one or more first patterned layers deposited on top of the buffer layer, wherein each of the first patterned layers is comprised of a bottom lateral epitaxial overgrowth (LEO) mask layer and a LEO nitride layer filling holes in the bottom LEO mask layer, one or more active layers formed on the first patterned layers, and one or more second patterned layers deposited on top of the active layer, wherein each of the second patterned layers is comprised of a top LEO mask layer and a LEO nitride layer filling holes in the top LEO mask layer, wherein the top and/or bottom LEO mask layers act as a mirror, optical confinement layer, grating, wavelength selective element, beam shaping element or beam directing element for the active layers.
-
Citations
21 Claims
-
1. A structure using integrated optical elements, comprising:
-
(a) a substrate;
(b) a buffer layer grown on the substrate;
(c) one or more first patterned layers deposited on top of the buffer layer, wherein each of the first patterned layers is comprised of a bottom lateral epitaxial overgrowth (LEO) mask layer and a first LEO nitride layer filling holes in the bottom LEO mask layer;
(d) one or more active layers formed on the first patterned layers; and
(e) one or more second patterned layers deposited on top of the active layer, wherein each of the second patterned layers is comprised of a top LEO mask layer and a second LEO nitride layer filling holes in the top LEO mask layer;
(f) wherein the top, bottom, or top and bottom LEO mask layers, act as a mirror, optical confinement layer, grating, wavelength selective element, beam shaping element or beam directing element for the active layers. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
-
-
15. A method of fabricating a structure using integrated optical elements, comprising:
-
(a) growing a buffer layer on a substrate;
(b) depositing one or more first patterned layers on top of the buffer layer, wherein each of the first patterned layers is comprised of a bottom lateral epitaxial overgrowth (LEO) mask layer and a first LEO nitride layer filling holes in the bottom LEO mask layer;
(c) forming one or more active layers on the first patterned layers; and
(d) depositing one or more second patterned layers on top of the active layers, wherein each of the second patterned layers is comprised of a top LEO mask layer and a second LEO nitride layer filling holes in the top LEO mask layer;
(e) wherein each patterned layer acts as a mirror, optical confinement layer, grating, wavelength selective element, beam shaping element or beam directing element for the active layers.
-
-
16. A structure using integrated optical elements, comprising:
-
(a) a substrate;
(b) a buffer layer on the substrate, one or more bottom confining layers on the buffer layers and one or more active layers grown on the bottom confining layers; and
(c) one or more patterned layers deposited on top of the active layers, wherein each of the patterned layers is comprised of a top LEO mask layer and a LEO nitride layer filling holes in the top LEO mask layer;
(d) wherein the top LEO mask layers act as a mirror, optical confinement layer, grating, wavelength selective element, beam shaping element or beam directing element for the active layers. - View Dependent Claims (17, 18, 19, 20)
-
-
21. A method of fabricating a structure using integrated optical elements, comprising:
-
(a) growing a buffer layer on a substrate, growing one or more bottom confining layers on the buffer layer, and growing one or more active layers on the bottom confining layers;
(b) depositing one or more patterned layers on top of the active layers, wherein each of the patterned layers is comprised of a top LEO mask layer and a LEO nitride layer filling holes in the top LEO mask layer;
(c) wherein the patterned layers act as a mirror, optical confinement layer, grating, wavelength selective element, beam shaping element or beam directing element for the active layers.
-
Specification