Organic light emitting diode (OLED) display panel and method of forming polysilicon channel layer thereof
First Claim
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1. An organic light emitting diode (OLED) display panel, comprising:
- a substrate;
a pixel disposed on the substrate; and
a first thin film transistor disposed inside the pixel and comprising a first polysilicon channel layer, wherein a first dopant atom not selected from the III A group and the VA group is doped inside the first polysilicon channel layer.
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Abstract
An organic light emitting diode (OLED) display panel and a method of forming a polysilicon channel layer thereof are provided. In the method, firstly, a substrate having a polysilicon layer disposed thereon is provided. Then, a dopant atom not selected from the IIIA group and the VA group is doped inside the polysilcon layer to form a polysilicon channel layer.
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Citations
20 Claims
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1. An organic light emitting diode (OLED) display panel, comprising:
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a substrate;
a pixel disposed on the substrate; and
a first thin film transistor disposed inside the pixel and comprising a first polysilicon channel layer, wherein a first dopant atom not selected from the III A group and the VA group is doped inside the first polysilicon channel layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method of forming a polysilicon channel layer, comprising:
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providing a substrate having a first polysilicon layer and a second polysilicon layer disposed thereon;
covering the substrate by a first mask, wherein the substrate has a first opening for exposing the first polysilicon layer; and
doping a first dopant atom not selected from the IIIA group and the VA group inside the first polysilicon layer to form a first polysilicon channel layer. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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16. A method of forming a polysilicon channel layer, comprising:
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providing a substrate having a first polysilicon layer and a second polysilicon layer disposed thereon;
covering the substrate by a first mask, wherein the first mask has a first opening and a second opening for respectively exposing the first polysilicon layer and the second polysilicon layer;
doping a first dopant atom not selected from the IIIA group and the VA group inside the first polysilicon layer and the second polysilicon layer to respectively form a first polysilicon channel layer and a second polysilicon channel layer, wherein the doping concentration of the first dopant atom in the first polysilicon channel layer is the same with the doping concentration of the first dopant atom in the second polysilicon channel layer;
removing the first mask and covering the substrate by a second mask, wherein the second mask has a third opening for exposing the first polysilicon channel layer; and
doping a second dopant atom inside the first polysilicon channel layer to form a third polysilicon channel layer, wherein the total doping concentration of the first dopant atom and the second dopant atom in the third polysilicon channel layer is larger than the doping concentration of the first dopant atom in the second polysilicon channel layer. - View Dependent Claims (17, 18, 19, 20)
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Specification