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Methods, systems, and apparatus for uniform chemical-vapor depositions

  • US 20070131169A1
  • Filed: 01/09/2007
  • Published: 06/14/2007
  • Est. Priority Date: 03/01/2001
  • Status: Abandoned Application
First Claim
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1. A gas distribution fixture for atomic-layer deposition, the fixture comprising:

  • a non-reactive plate including a plurality of holes; and

    a wall surrounding at least a portion of the plate.

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