Lithographic apparatus and device manufacturing method

• US 20070132970A1
• Filed: 06/08/2006
• Published: 06/14/2007
• Est. Priority Date: 11/12/2002
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Ritsema, Roelof, Bijlaart, Erik, Butler, Hans, Streefkerk, Bob, Van Schaik, Frank, Straaijer, Alexander, Lof, Joeri, Van Santen, Helmar, Simon, Klaus, Kolesnychenko, Aleksey, Mertens, Jeroen Johannes, Mulkens, Johannes Catharinus, De Smit, Joannes, Meijer, Hendricus, Hoogendam, Christiaan, Loopstra, Erik, Donders, Sjoerd, Sengers, Thimotheus
• Granted Patent: US 7,593,092 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

Claims

1-51. -51. (canceled)

52. A substrate holding apparatus which contacts an undersurface of a substrate and holds the substrate, at least a portion of a top surface of the substrate being immersed in liquid, said apparatus comprising:

a chuck unit to attract the substrate; and

a preventing system to prevent the liquid from reaching the undersurface of the substrate.

53. An apparatus according to claim 52, wherein said preventing system comprises an elastic sealing member arranged so that said elastic sealing member is in contact with the undersurface along a periphery of the undersurface.

54. An apparatus according to claim 52, wherein said preventing system comprises a differential exhaust system to differentially-exhaust a space between the undersurface and said chuck unit along a periphery of the undersurface.

55. An apparatus according to claim 52, wherein said preventing system comprises a liquid-sealant pool arranged along a periphery of the chuck unit.

56. An apparatus according to claim 55, wherein said preventing system comprises a groove defined by said chuck unit, and a supply unit to supply a liquid sealant to said groove.

57. An apparatus according to claim 56, wherein said preventing system comprises an exhaust unit to exhaust the liquid sealant in said groove.

58. An exposure apparatus, comprising:

a projection optical system for projecting a pattern of an original onto a substrate;

a liquid application device for applying liquid to the substrate;

a chuck unit for securing the substrate; and

a liquid prevention device for preventing liquid from contacting an undersurface of the substrate.

59. A method of manufacturing a device, comprising the steps of:

providing a projecting optical system for projecting a pattern of an original onto a substrate;

securing the substrate with a chuck unit;

applying a liquid to the substrate; and

preventing liquid from contacting an undersurface of the substrate.

60. A substrate holding apparatus for securing an underside of a substrate, with at least a portion of a top surface of the substrate being immersed in liquid, said apparatus comprising:

a chuck unit to secure the substrate from the underside; and

liquid sealing means for sealing the underside of the substrate from exposure to the liquid.

61. A substrate holding apparatus according to claim 60, wherein said liquid sealing means includes an elastic sealing member arranged to be in contact along a periphery of the undersurface.

62. A substrate holding apparatus according to claim 60, wherein said liquid sealing means includes an exhaust system to exhaust a space along a periphery of the undersurface.

63. A substrate holding apparatus according to claim 62, wherein said exhaust system includes a plurality of ducts, with each said duct having a different exhaust pressure.

64. A substrate holding apparatus according to claim 60, wherein said liquid sealing means includes a liquid sealant pool arranged around a periphery of said chuck unit.

65. A substrate holding apparatus according to claim 64, wherein said liquid sealant pool includes a liquid sealant supply duct and a liquid sealant exhaust duct.

66. A substrate holding apparatus according to claim 60, wherein said chuck unit is a vacuum chuck.