Exposure apparatus, exposure method, and method for producing device
First Claim
1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate while moving the substrate in a predetermined direction, the exposure apparatus comprising:
- a first surface which is provided opposite to a surface of an object arranged at a position capable of being irradiated with the exposure light beam and which is provided to surround an optical path space for the exposure light beam;
a second surface which is provided opposite to the surface of the object and which is provided outside the first surface with respect to the optical path space for the exposure light beam in the predetermined direction; and
a recovery port which recovers a liquid for filling the optical path space for the exposure light beam therewith, wherein;
the first surface is provided substantially in parallel to the surface of the object;
the second surface is provided at a position separated farther from the surface of the object than the first surface; and
the recovery port is provided at a position different from those of the first surface and the second surface.
1 Assignment
0 Petitions
Accused Products
Abstract
An exposure apparatus includes a first land surface which faces a surface of a substrate and which surrounds an optical path space for an exposure light beam, a second land surfaces which faces the surface of the substrate and which is provided outside the first land surface in a predetermined direction, and a recovery port which is provided to recover a liquid for filling the optical path space therewith. The first land surface is provided subsequently in parallel to the surface of the substrate. The second land surface is provided at positions separated farther from the surface of the substrate than the first land surface. The recovery port is provided outside the first land surface and the second land surface. Even when the exposure is performed while moving the substrate, the optical path space for the exposure light beam can be filled with the liquid in a desired state.
48 Citations
117 Claims
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1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate while moving the substrate in a predetermined direction, the exposure apparatus comprising:
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a first surface which is provided opposite to a surface of an object arranged at a position capable of being irradiated with the exposure light beam and which is provided to surround an optical path space for the exposure light beam;
a second surface which is provided opposite to the surface of the object and which is provided outside the first surface with respect to the optical path space for the exposure light beam in the predetermined direction; and
a recovery port which recovers a liquid for filling the optical path space for the exposure light beam therewith, wherein;
the first surface is provided substantially in parallel to the surface of the object;
the second surface is provided at a position separated farther from the surface of the object than the first surface; and
the recovery port is provided at a position different from those of the first surface and the second surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 107)
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24. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate while moving the substrate in a predetermined direction, the exposure apparatus comprising:
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a first surface which is provided opposite to a surface of an object arranged at a position capable of being irradiated with the exposure light beam and which is provided to surround an optical path space for the exposure light beam;
a second surface which is provided opposite to the surface of the object and which is provided outside the first surface with respect to the optical path space for the exposure light beam in the predetermined direction; and
a recovery port which recovers a liquid for filling the optical path space for the exposure light beam therewith, wherein;
the first surface is provided substantially in parallel to the surface of the object;
the second surface is provided at a position separated farther from the surface of the object than the first surface; and
the recovery port is provided on the second surface, and a size of the recovery port is smaller than a size of the exposure light beam as viewed in a cross section. - View Dependent Claims (25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 108)
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46. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate while moving the substrate in a predetermined direction, the exposure apparatus comprising:
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a first surface which is provided opposite to a surface of an object arranged at a position capable of being irradiated with the exposure light beam and which is provided to surround an optical path space for the exposure light beam;
a second surface which is provided opposite to the surface of the object and which is provided outside the first surface with respect to the optical path space for the exposure light beam in the predetermined direction; and
a recovery port which recovers a liquid for filling the optical path space for the exposure light beam therewith, wherein;
the first surface is provided substantially in parallel to the surface of the object;
the second surface is provided at a position separated farther from the surface of the object than the first surface; and
the first surface and the second surface are provided in a predetermined positional relationship to prevent the liquid, which exists between the surface of the object and the second surface, from being separated from the second surface. - View Dependent Claims (47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 109)
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67. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate while moving the substrate in a predetermined direction, the exposure apparatus comprising:
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a first surface which is provided opposite to a surface of an object arranged at a position capable of being irradiated with the exposure light beam and which is provided to surround an optical path space for the exposure light beam;
a second surface which is provided opposite to the surface of the object and which is provided outside the first surface with respect to the optical path space for the exposure light beam in the predetermined direction; and
a recovery port which recovers a liquid for filling the optical path space for the exposure light beam therewith, wherein;
the first surface is provided substantially in parallel to the surface of the object;
the second surface is provided substantially in parallel to the surface of the object at a position separated farther from the surface of the object than the first surface; and
a difference in height provided between the first surface and the second surface is not more than 1 mm. - View Dependent Claims (68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, 110)
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83. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate while moving the substrate in a predetermined direction, the exposure apparatus comprising:
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a first surface which is provided opposite to a surface of an object arranged at a position capable of being irradiated with the exposure light beam and which is provided to surround an optical path space for the exposure light beam;
a second surface which is provided opposite to the surface of the object and which is provided outside the first surface with respect to the optical path space for the exposure light beam in the predetermined direction; and
a recovery port which recovers a liquid for filling the optical path space for the exposure light beam therewith, wherein;
the first surface is provided substantially in parallel to the surface of the object;
the second surface is provided at a position separated farther from the surface of the object than the first surface, the second surface being an inclined surface in which a distance with respect to the surface of the object is increased at positions separated farther from the optical path space for the exposure light beam in the predetermined direction; and
an angle, which is formed by the first surface and the second surface, is not more than 10 degrees. - View Dependent Claims (84, 85, 86, 87, 88, 89, 90, 91, 92, 93, 94, 95, 96, 97, 98, 111)
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99. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate while moving the substrate in a predetermined direction, the exposure apparatus comprising:
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a substrate stage which is movable while holding the substrate; and
a nozzle member which has a lower surface arranged to surround an optical path space for the exposure light beam and to face an upper surface of the substrate stage and which is capable of retaining a liquid between the lower surface and the upper surface of the substrate stage, wherein;
a movable range of the substrate stage is controlled to move an end of the upper surface of the substrate stage in the predetermined direction to a position closer to the optical path space for the exposure light beam than an end of the lower surface of the nozzle member in a state in which the liquid is retained between the lower surface of the nozzle member and at least one of the upper surface of the substrate stage and a surface of the substrate held by the substrate stage. - View Dependent Claims (100, 112)
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101. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid while moving the substrate in a predetermined direction, the exposure apparatus comprising:
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a liquid immersion mechanism which forms a liquid immersion area of the liquid on the substrate; and
a recovery port which is provided in the liquid immersion mechanism to recover the liquid on the substrate, wherein;
the recovery port is provided outside an extending area which extends in the predetermined direction with respect to an optical path space for the exposure light beam which passes through the liquid. - View Dependent Claims (102, 103, 104, 105, 106, 113)
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114. An exposure method for exposing a substrate, the exposure method comprising:
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providing a liquid on the substrate;
exposing the substrate by radiating an exposure light beam through the liquid onto the substrate while moving the substrate in a predetermined direction; and
recovering the liquid outside an extending area which extends in the predetermined direction with respect to an optical path space for the exposure light beam which passes through the liquid. - View Dependent Claims (115, 116, 117)
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Specification