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Multiple stage MEMS release for isolation of similar materials

  • US 20070138582A1
  • Filed: 12/20/2005
  • Published: 06/21/2007
  • Est. Priority Date: 12/20/2005
  • Status: Active Grant
First Claim
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1. A starting structure useful in manufacturing a micro-mechanical device, said structure having layers in an operative arrangement each layer sequentially stacked one on the other, said layers comprising a first sacrificial layer, a second sacrificial layer, and desired underlying layer(s), said first sacrificial layer having similar material etching properties with said desired underlying layer, said second sacrificial layer having widely separated material etching properties from said desired underlying layer, wherein said second sacrificial layer being substantially resistant to a material used to remove said first sacrificial layer and wherein said second sacrificial layer is enabled to protect said underlying layer as said first sacrificial layer is removed by said etching.

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