Gas scrubber and method related thereto

• US 20070141430A1
• Filed: 12/21/2005
• Published: 06/21/2007
• Est. Priority Date: 12/21/2005
• Status: Abandoned Application

• Current Assignee: General Electric Company
• Original Assignee: General Electric Company
• Inventors: Lemmon, John, Wei, Chang, Shapiro, Andrew, Lu, Su, Liu, Jinghua, Huang, Qunjian, Hart, Richard
• Application Number:
  US11/313,629
• Publication Number:
  US 20070141430A1
• Time in Patent Office: Days
• US Class Current: 429/403
• CPC Class Codes: B01D 2253/102 Carbon
• CPC Class Codes: B01D 2253/108 Zeolites
• CPC Class Codes: B01D 2253/202 Polymeric adsorbents
• CPC Class Codes: B01D 2257/504 Carbon dioxide
• CPC Class Codes: B01D 2258/0208 from fuel cells
• CPC Class Codes: B01D 53/02 by adsorption, e.g. preparative gas chromatography solid sorbent compositions B01J20/00, preparation of inorganic compounds or elements C01
• CPC Class Codes: B01J 20/20 comprising free carbon; comprising carbon obtained by carbonising processes
• CPC Class Codes: B01J 20/26 Synthetic macromolecular compounds
• CPC Class Codes: B01J 20/261 obtained by reactions only involving carbon to carbon unsaturated bonds macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds per se C08F
• CPC Class Codes: B01J 20/264 derived from different types of monomers, e.g. linear or branched copolymers, block copolymers, graft copolymers
• CPC Class Codes: B01J 20/265 modified or post-treated polymers polymer carriers or substrates subjected to further impregnating or coating B01J20/3208
• CPC Class Codes: H01M 12/02 Details of electrodes H01M4/00; of non-active parts H01M50/00
• CPC Class Codes: H01M 8/0662 Treatment of gaseous reactants or gaseous residues, e.g. cleaning
• CPC Class Codes: Y02C 20/40 of CO2
• CPC Class Codes: Y02E 60/50 Fuel cells

Abstract

A galvanic cell utilizing a gas scrubber is provided. The galvanic cell may include a galvanic cell unit and a gas scrubber comprising an active material layer, a resistance coil in contact with the active material layer, a first shutter positioned between the active material layer and ambient air, a second shutter may be positioned between the galvanic cell unit and the active material layer.

Claims

1. A gas scrubber, comprising:

an active material layer;

a resistance coil communicating with the active material layer;

a first shutter that is disposed between the active material layer and ambient air; and

a second shutter that is between a galvanic cell unit and the active material layer.

2. The gas scrubber of claim 1, wherein the active material layer comprises an active material capable of binding carbon dioxide.

3. The gas scrubber of claim 2, wherein the active material comprises an amine.

4. The gas scrubber of claim 2, wherein the active material comprises an amine-functionalized polymer, a copolymer, blends of an amine-functionalized polymer and copolymer, or combinations thereof.

5. The gas scrubber of claim 3, wherein the amine comprises one or more of monoethanolamine, diethanolamine, or triethanolamine.

6. The gas scrubber of claim 2, wherein the active material comprises one or more amidine.

7. The gas scrubber of claim 2, wherein the active material comprises an amidine-functionalized polymer, a copolymer, blends of an amidine-functionalized polymer and copolymer, or combinations thereof.

8. The gas scrubber of claim 6, wherein the amidine comprises 1,8-diazabicyclo[5.4.0]-undec-7-ene (DBU), tetrahydropyrimidine (THP), N-methyltetrahydropyrimidine (MTHP), or polystyrene, polymethacrylate, polyacrylate etc., modified by DBU, THP or MTHP or combinations thereof.

9. The gas scrubber of claim 2, wherein the active material is a polymer produced through radical polymerization, cationic polymerization, anionic polymerization, group transfer polymerization, ring-opening polymerization, ring-open metathesis polymerization, coordination polymerization, condensation polymerization, or combinations thereof.

10. The gas scrubber of claim 2, wherein the active material is a polymer produced by modification of a premade polymer structure using suitable active molecules.

11. The gas scrubber of claim 2, wherein the active material is supported by a porous material.

12. The gas scrubber of claim 11, wherein the porous material comprises a porous inorganic material.

13. The gas scrubber of claim 12, wherein the porous inorganic material comprises a molecular sieve.

14. The gas scrubber of claim 11, wherein the porous material comprises a porous carbon material.

15. The gas scrubber of claim 14, wherein the porous material comprises an active carbon.

16. The gas scrubber of claim 11, wherein the porous material comprises a carbon fiber.

17. The gas scrubber of claim 11, wherein the porous material comprises a carbon tube.

18. The gas scrubber of claim 11, wherein the porous material comprises a charcoal.

19. The gas scrubber of claim 11, wherein the porous material comprises a acetylene black.

20. The gas scrubber of claim 11, wherein the porous material comprises a porous polymer material.

21. The gas scrubber of claim 1, wherein the galvanic cell unit comprises a rechargeable fuel cell.

22. The gas scrubber of claim 1, wherein the galvanic cell unit comprises an alkaline fuel cell.

23. The gas scrubber of claim 1, wherein the galvanic cell unit comprises a metal/air battery.

24. The gas scrubber of claim 1, wherein the resistance coil is responsive to one or both of heat or electricity such that application of one or both of heat or electricity unbinds or releases carbon dioxide from the active material layer.

25. A method of preparing active material layer, comprising:

preparing an active material;

preparing a porous support material;

mixing the active material with the support material and an amount of solvent,

sufficient to create a mixture;

stirring the mixture for a period of time under ultrasonic condition;

drying the mixture to evaporate the solvent;

vacuum-drying the mixture for some time to remove the trace of solvent; and

fabricating active material layer.

26. The method of claim 25, wherein the solvent comprises water or an organic liquid.

27. The method of claim 25, wherein the active material layer comprises a shape including a plate, a film, a column, a cube or combinations thereof.

28. The method of claim 25, wherein the fabricating an active material layer comprises binding at least a portion of the active material layer on organic, inorganic or metal substrates.

29. The method of claim 28, wherein the organic, inorganic or metal substrates comprise a porous plastic plate, silica wafer, Ni foam or combinations thereof.

30. A method, comprising:

allowing ambient air to contact an active material layer, wherein the ambient air comprises a target gas and the active material layer comprises an amidine;

binding the target gas to the amidine; and

flowing the ambient air, which is free of the target gas, to contact an electrode.

31. The method as defined in claim 30, wherein the target gas is carbon dioxide.

32. The method as defined in claim 30, wherein the electrode is a cathode.

33. A method, comprising:

opening both a first shutter and a second shutter to unblock a path from ambient air to an electrode through an active material layer;

flowing ambient air through the open first shutter to contact the active material layer, wherein the ambient air comprises a target gas and the active material layer comprises an active material;

binding the target gas to the active materials;

flowing the ambient air, which is free of the target gas, through the open second shutter to contact the electrode.

34. The method as defined in claim 33, wherein the binding comprises chemically binding or physically binding the target gas.

35. The method as defined in claim 33, wherein the active material layer comprises an amine or an amidine and the binding is chemical binding.

36. The method as defined in claim 33, wherein the active material layer comprises a molecular sieve and the binding is physical binding.

37. The method as defined in claim 33, further comprising applying thermal stimulus, electric stimulus, or both stimuli to a resistance coil in contact with the active material layer in an amount that is sufficient to release otherwise bound target gas from the active material.

38. The method of claim 37, further comprising opening the first shutter to release otherwise bound target gas to ambient air.

39. The method of claim 37, comprising closing the second shutter.

40. The method of claim 37, comprising purging pure air or oxygen into the active material to help the release of the bound target gas from the active material.

41. A system, comprising:

means for controlling contact of ambient air to an electrode, wherein the ambient air comprises a target gas; and

means for binding the target gas.