Highly Efficient Gas Distribution Arrangement For Plasma Tube Of A Plasma Processing Chamber
First Claim
1. A gas distribution arrangement configured to provide a process gas downstream to a plasma tube of a plasma processing chamber, said plasma tube having a top end, comprising:
- a body having a first end, said first end having a width larger than said plasma tube and a protrusion end adapted to be inserted into said top end;
a gas inlet vertically disposed in said body, extending from said first end toward said protrusion end, terminating before extending through said protrusion end; and
a plurality of directional inlet channels extending from a lower end of said gas inlet through said protrusion end.
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0 Petitions
Accused Products
Abstract
A gas distribution arrangement configured to provide a process gas downstream to a plasma tube of a plasma processing chamber. The plasma tube has a top end. The arrangement includes a body having a first end. The first end has a width larger than the plasma tube and a protrusion end adapted to be inserted into the top end. The arrangement also includes a gas inlet vertically disposed in the body. The gas inlet extends from the first end toward the protrusion end and the gas inlet terminates before extending through the protrusion end. The arrangement further includes a plurality of directional inlet channels extending from a lower end of the gas inlet through the protrusion end.
72 Citations
30 Claims
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1. A gas distribution arrangement configured to provide a process gas downstream to a plasma tube of a plasma processing chamber, said plasma tube having a top end, comprising:
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a body having a first end, said first end having a width larger than said plasma tube and a protrusion end adapted to be inserted into said top end;
a gas inlet vertically disposed in said body, extending from said first end toward said protrusion end, terminating before extending through said protrusion end; and
a plurality of directional inlet channels extending from a lower end of said gas inlet through said protrusion end. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A gas distribution arrangement configured to provide a process gas downstream to a plasma tube of a plasma processing chamber, said plasma tube having a top end and at least one o-ring disposed around said plasma tube proximate said top end, comprising:
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a gas inlet; and
a plurality of directional inlet channels extending from a lower end of said gas inlet, said plurality of directional inlet channels being in communication with said gas inlet wherein at least one of said directional inlet channels directs said process gas into an o-ring adjacent area of a plasma tube wall that is adjacent to said at least one o-ring. - View Dependent Claims (9, 10, 11, 12, 13)
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14. A gas distribution arrangement configured to provide a process gas downstream to a plasma tube of a plasma processing chamber, said plasma tube having a top end and at least one o-ring disposed around said plasma tube proximate said top end, comprising:
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a gas inlet; and
a plurality of side channels extending from a section of a wall of said gas inlet toward a wall of said plasma tube, wherein said plurality of side channels is in communication with said gas inlet, wherein at least one of said side channels directs said process gas into an o-ring adjacent area of said wall of said plasma tube that is adjacent to said at least one o-ring. - View Dependent Claims (15, 16, 17)
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18. A gas distribution arrangement configured to provide a process gas downstream to a plasma tube of a plasma processing chamber, said plasma tube having a top end, comprising:
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a body having a first end, said first end having a width larger than said plasma tube and a protrusion end adapted to be inserted into said top end;
a gas inlet vertically disposed in said body, extending from said first end toward said top end, terminating before extending through said top end; and
a plurality of side channels extending from a section of a wall of said gas inlet toward a wall of said plasma tube, wherein at least a portion of said plurality of side channels is disposed above said top end, said plurality of side channels being in communication with said gas inlet, wherein at least one of said side channels directs said process gas into an o-ring adjacent area of a plasma tube wall that is adjacent to said at least one o-ring. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30)
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Specification