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Highly Efficient Gas Distribution Arrangement For Plasma Tube Of A Plasma Processing Chamber

  • US 20070145021A1
  • Filed: 12/23/2005
  • Published: 06/28/2007
  • Est. Priority Date: 12/23/2005
  • Status: Active Grant
First Claim
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1. A gas distribution arrangement configured to provide a process gas downstream to a plasma tube of a plasma processing chamber, said plasma tube having a top end, comprising:

  • a body having a first end, said first end having a width larger than said plasma tube and a protrusion end adapted to be inserted into said top end;

    a gas inlet vertically disposed in said body, extending from said first end toward said protrusion end, terminating before extending through said protrusion end; and

    a plurality of directional inlet channels extending from a lower end of said gas inlet through said protrusion end.

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