SEMICONDUCTOR DEVICE
First Claim
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1. A device comprising:
- a semiconductor substrate including a device isolation layer;
a well region formed in the semiconductor substrate;
a gate oxide layer formed over the semiconductor substrate;
a gate electrode formed over the gate oxide layer; and
an annealed liner layer formed over the gate oxide layer and the gate electrode.
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Abstract
Embodiments relate to a method for manufacturing a semiconductor substrate. According to embodiments, a gate oxide layer may be formed on a semiconductor substrate. Also, a well region may be formed in the semiconductor substrate including the gate oxide layer. Then, after forming a gate electrode on the semiconductor substrate, a liner layer may be formed on the semiconductor substrate. Next, the semiconductor substrate including the liner layer may be annealed to form an annealed liner layer. Finally, an interlayer insulation layer may be formed on the annealed liner layer.
10 Citations
20 Claims
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1. A device comprising:
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a semiconductor substrate including a device isolation layer;
a well region formed in the semiconductor substrate;
a gate oxide layer formed over the semiconductor substrate;
a gate electrode formed over the gate oxide layer; and
an annealed liner layer formed over the gate oxide layer and the gate electrode. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method comprising:
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forming a gate oxide layer over a semiconductor substrate;
forming a well region in the semiconductor substrate including the gate oxide layer;
forming a gate electrode over the semiconductor substrate;
forming a liner layer over the semiconductor substrate; and
annealing the semiconductor substrate including the liner layer to form an annealed liner layer. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14, 15)
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16. A device, comprising:
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a semiconductor substrate having a well region formed therein;
an ion implanted oxide layer over at least a portion of the well region; and
an annealed linear layer over at least a portion of the ion implanted oxide layer. - View Dependent Claims (17, 18, 19, 20)
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Specification