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Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region

  • US 20070146672A1
  • Filed: 11/06/2006
  • Published: 06/28/2007
  • Est. Priority Date: 09/30/2003
  • Status: Abandoned Application
First Claim
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1. A method to compensate for errors in a pattern to be printed using a spatial light modulator (SLM), comprising:

  • defining exposure areas on a photosensitive surface, the exposure areas overlapping to form an overlap zone therebetween;

    determining attenuation of at least one of a predicted aerial image and a corresponding resist image;

    exposing the exposure areas to print an image therein, the exposing extending through the overlap zone; and

    implementing the determined attenuation during the exposing within the overlap zone.

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