Method of adjusting lighting optical device, lighting optical device, exposure system, and exposure method

• US 20070146676A1
• Filed: 12/26/2006
• Published: 06/28/2007
• Est. Priority Date: 01/21/2005
• Status: Abandoned Application

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Kurita, Shinichi, Hirota, Hiroyuki, Tanitsu, Osamu, Shigematsu, Koji
• Application Number:
  US11/644,966
• Publication Number:
  US 20070146676A1
• Time in Patent Office: Days
• US Class Current: 355/71
• CPC Class Codes: G02B 26/00 Optical devices or arrangements for the control of light using movable or deformable optical elements control of light by modification of the optical properties of the media of the elements involved therein G02F1/00
• CPC Class Codes: G02B 26/008 in the form of devices for effecting sequential colour changes, e.g. colour wheels
• CPC Class Codes: G02B 26/06 for controlling the phase of light G02B26/08 takes precedence , measuring optical phase difference G01J9/00
• CPC Class Codes: G02B 27/286 for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another G02B5/3083 takes precedence; light guide coupling means utilising polarising elements G02B6/34
• CPC Class Codes: G03F 7/70108 Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
• CPC Class Codes: G03F 7/70191 Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
• CPC Class Codes: G03F 7/705 Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
• CPC Class Codes: G03F 7/70566 Polarisation control
• CPC Class Codes: G03F 7/70991 Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Abstract

An illumination optical apparatus is arranged to illuminate a surface to be illuminated, with light in a desired polarization state, without substantive influence of manufacturing error of an optical member functioning as a wave plate. The illumination optical apparatus illuminates the surface to be illuminated (M, W) on the basis of light from a light source (1). The illumination optical apparatus is provided with a polarization converting element (12) disposed on or near an illumination pupil plane and adapted for converting a polarization state of incident light into a predetermined polarization state. The polarization converting element has a plurality of variable optical rotating members for variably yielding an angle of rotation to incident linearly polarized light. Each variable optical rotating member has two deviation prisms which are made of an optical material with an optical rotatory power and which are movable relative to each other along a direction intersecting with the optical axis (AX).

Claims

1. An illumination optical apparatus for illuminating a surface to be illuminated, in a desired polarization state on the basis of light from a light source,

the illumination optical apparatus comprising:

first polarization changing means for locally changing a polarization state of light to illuminate the surface to be illuminated; and

second polarization changing means for locally changing a polarization state at a position on or near a pupil plane of the illumination optical apparatus.

2. An illumination optical apparatus according to claim 1, wherein at least one of the first and second polarization changing means comprises a phase member for locally changing a phase of passing light.

3. An illumination optical apparatus according to claim 2, wherein the phase member has a pair of optical members made of a biaxial crystal material and located in mutual proximity in a direction of the optical axis,

wherein the pair of optical members are positioned so that a crystallographic axis of one optical member is substantially perpendicular to a crystallographic axis of the other optical member, and

wherein the pair of optical members are formed so that a difference between a thickness of the one optical member and a thickness of the other optical member along a line parallel to the optical axis is different from that along at least one line among other lines parallel to the optical axis.

4. An illumination optical apparatus according to claim 2 or 3, wherein the phase member has a plurality of phase change adjusters which are arranged corresponding to respective regions on the pupil plane and each of which can adjust a phase change of a passing light beam.

5. An illumination optical apparatus according to claim 4, wherein each of the phase change adjusters has a Babinet-Soleil wave plate.

6. An illumination optical apparatus according to any one of claims 1 to 5, wherein at least one of the first and second polarization changing means has a polarization varying member for making a polarization state of incident light locally adjustable.

7. An illumination optical apparatus according to claim 6, wherein the polarization varying member has a plurality of polarization varying elements for independently adjusting polarization states of incident light in a plurality of local regions.

8. An illumination optical apparatus according to any one of claims 1 to 7, further comprising a polarization state measuring device for measuring a polarization state of light reaching the surface to be illuminated,

wherein at least one of the first and second polarization changing means is adjusted according to a result of measurement by the polarization state measuring device.

9. An illumination optical apparatus according to any one of claims 1 to 8, wherein the first polarization changing means is located at any one of the surface to be illuminated, a position near the surface to be illuminated, a position optically conjugate with the surface to be illuminated, and a position near the position optically conjugate with the surface to be illuminated, and

wherein the second polarization changing means is located at a position on or near the pupil plane of the illumination optical apparatus.

29. An exposure apparatus comprising the illumination optical apparatus as defined in any one of claims 1 to 28, wherein a predetermined pattern illuminated by the illumination optical apparatus is projected onto a photosensitive substrate to effect exposure thereof.

30. An exposure method of projecting a predetermined pattern onto a photosensitive substrate to effect exposure thereof, using the illumination optical apparatus as defined in any one of claims 1 to 28.

31. A method of manufacturing device comprising:

an exposure step of projecting a predetermined pattern onto a photosensitive substrate to effect exposure thereof, using the illumination optical apparatus as defined in any one of claims 1 to 28; and

a development step of developing the photosensitive substrate exposed in the exposure step.

10. An illumination optical apparatus for illuminating a surface to be illuminated, based on light from a light source,

the illumination optical apparatus comprising a polarization converting element located on or near an illumination pupil plane and adapted for converting a polarization state of incident light into a predetermined polarization state,

wherein the polarization converting element locally changes a polarization state of light at a position on or near the pupil plane of the illumination optical apparatus.

11. An illumination optical apparatus according to claim 10, wherein the polarization converting element has a plurality of variable optical rotating members for variably yielding a polarization rotation angle to incident linearly polarized light.

12. An illumination optical apparatus according to claim 11, wherein each of the plurality of variable optical rotating members has two deviation prisms made of an optical material with an optical activity and arranged to be movable relative to each other along a direction intersecting with the optical axis of the illumination optical apparatus.

13. An illumination optical apparatus according to claim 12, wherein the two deviation prisms are arranged so that crystallographic axes thereof are substantially parallel to the optical axis.

14. An illumination optical apparatus according to claim 12 or 13, wherein the two deviation prisms have their respective wedge-shaped cross sections complementary to each other.

15. An illumination optical apparatus according to any one of claims 11 to 14, wherein the plurality of variable optical rotating members are arranged along a circumferential direction of a circle centered around the optical axis of the illumination optical apparatus.

16. An illumination optical apparatus according to claim 15, wherein each of the plurality of variable optical rotating members has a substantially sectorial shape.

17. An illumination optical apparatus according to any one of claims 11 to 16, further comprising a polarization state measuring device for measuring a polarization state of light reaching the surface to be illuminated,

wherein each of the plurality of variable optical rotating members is adjusted according to a result of measurement by the polarization state measuring device.

18. An illumination optical apparatus according to any one of claims 10 to 17, wherein the polarization converting element has a plurality of variable phase difference members for variably yielding a phase difference between incident light and emerging light.

19. An illumination optical apparatus according to claim 18, wherein each of the plurality of variable phase difference members has a Babinet compensator or a Soleil compensator rotatably arranged around an axis substantially parallel to the optical axis of the illumination optical apparatus.

20. An illumination optical apparatus according to claim 18 or 19, wherein the plurality of variable phase difference members are arranged along a circumferential direction of a circle centered around the optical axis of the illumination optical apparatus.

21. An illumination optical apparatus according to any one of claims 18 to 20, further comprising a polarization state measuring device for measuring a polarization state of light reaching the surface to be illuminated,

wherein each of the plurality of variable phase difference members is adjusted according to a result of measurement by the polarization state measuring device.

22. An illumination optical apparatus according to any one of claims 10 to 21, comprising an other polarization converting element located near the surface to be illuminated, at a position optically conjugate with the surface to be illuminated, or near the conjugate position and adapted for converting a polarization state of incident light into a predetermined polarization state,

wherein the other polarization converting element locally changes a polarization state of illumination light on the surface to be illuminated.

23. An illumination optical apparatus for illuminating a surface to be illuminated, based on light from a light source,

the illumination optical apparatus comprising:

a polarization converting element located near the surface to be illuminated, at a position optically conjugate with the surface to be illuminated, or near the conjugate position and adapted for converting a polarization state of incident light into a predetermined polarization state,

wherein the polarization converting element locally changes a polarization state of illumination light on the surface to be illuminated.

24. An illumination optical apparatus according to claim 23, wherein the polarization converting element has a plurality of variable phase difference members for variably yielding a phase difference between incident light and emerging light.

25. An illumination optical apparatus according to claim 24, wherein each of the plurality of variable phase difference members has a Babinet compensator or a Soleil compensator rotatably arranged around an axis substantially parallel to the optical axis of the illumination optical apparatus.

26. An illumination optical apparatus according to claim 24 or 25, further comprising a polarization state measuring device for measuring a polarization state of light reaching the surface to be illuminated,

wherein each of the plurality of variable phase difference members is adjusted according to a result of measurement by the polarization state measuring device.

27. An illumination optical apparatus according to any one of claims 23 to 26, wherein the polarization converting element has a plurality of variable optical rotating members for variably yielding a polarization rotation angle to incident linearly polarized light.

28. An illumination optical apparatus according to claim 27, further comprising a polarization state measuring device for measuring a polarization state of light reaching the surface to be illuminated,

wherein each of the plurality of variable optical rotating members is adjusted according to a result of measurement by the polarization state measuring device.

32. An adjustment method of adjusting an illumination optical apparatus for illuminating a surface to be illuminated, based on light from a light source,

the adjustment method comprising:

a first step of preparing a variable phase difference member for variably yielding a phase difference between incident light and emerging light;

a second step of setting the phase difference yielded by the variable phase difference member, to a predetermined value; and

a third step of placing the variable phase difference member in an optical path between the light source and the surface to be illuminated.

33. An adjustment method according to claim 32, wherein the third step comprises placing the variable phase difference member the phase difference of which was set to the predetermined value in the second step, in the optical path between the light source and the surface to be illuminated.

34. An adjustment method according to claim 32, wherein the second step comprises a fourth step of measuring light having passed through the variable phase difference yielding member placed in the optical path between the light source and the surface to be illuminated;

and a fifth step of setting the phase difference of the variable phase difference yielding member to a predetermined value on the basis of a result of the measurement in the fourth step.

35. An adjustment method according to claim 34, wherein the fourth step comprises measuring a polarization state of light reaching the surface to be illuminated.

36. An adjustment method according to any one of claims 32 to 35, comprising a sixth step of rotating the variable phase difference member around the optical axis of the illumination optical apparatus.

42. An illumination optical apparatus adjusted in accordance with the adjustment method as defined in any one of claims 32 to 41.

43. An adjustment method of adjusting an exposure apparatus for illuminating a predetermined pattern by an illumination optical apparatus and for projecting the predetermined pattern onto a photosensitive substrate to effect exposure thereof,

wherein the illumination optical apparatus is adjusted in accordance with the adjustment method as defined in any one of claims 32 to 41.

44. An adjustment method according to claim 43, further comprising a polarization state measuring step of measuring a polarization state of light reaching the photosensitive substrate,

wherein at least one of the first and second steps comprises effecting each adjustment according to a result of measurement in the polarization state measuring step.

45. An exposure apparatus adjusted in accordance with the adjustment method as defined in claim 43 or 44.

46. An adjustment method of adjusting an exposure system comprising:

a first exposure apparatus comprising a first illumination optical apparatus for illuminating a first pattern on a first mask, and adapted for projecting the first pattern of the first mask onto a photosensitive substrate to effect exposure thereof; and

a second exposure apparatus comprising a second illumination optical apparatus for illuminating a second pattern on a second mask, and adapted for projecting the second pattern of the second mask onto the photosensitive substrate to effect exposure thereof,

wherein the first and second illumination optical apparatus are adjusted in accordance with the adjustment method as defined in any one of claims 32 to 41.

47. An adjustment method according to claim 46, further comprising:

a step of measuring polarization states of light traveling to the photosensitive substrate in the first and second exposure apparatus; and

a step of adjusting the variable phase difference members in the first and second exposure apparatus, based on the polarization states measured.

48. An adjustment method according to claim 47, wherein the step of adjusting the variable phase difference members comprises performing such an adjustment that the polarization state of light traveling to the photosensitive substrate in the first exposure apparatus substantially coincides with the polarization state of light traveling to the photosensitive substrate in the second exposure apparatus.

49. An adjustment method according to claim 47 or 48, wherein the step of adjusting the variable phase difference members comprises a step of locally changing a polarization state of illumination light on the surface to be illuminated;

and a step of locally changing a polarization state of light at a position on or near the pupil plane of the illumination optical apparatus.

50. An exposure system adjusted in accordance with the adjustment method as defined in any one of claims 46 to 49.

51. A microdevice manufacturing factory comprising:

a manufacturing equipment group for various processes comprising the first exposure apparatus and the second exposure apparatus as defined in claim 50;

a local area network for connecting the manufacturing equipment group; and

a gateway for enabling access from the local area network to an external network outside the factory, wherein data communication is enabled for information about at least one equipment in the manufacturing equipment group.

52. A microdevice manufacturing method comprising:

a step of installing a manufacturing equipment group for various processes comprising the first exposure apparatus and the second exposure apparatus as defined in claim 50, in a microdevice manufacturing factory; and

a step of manufacturing a microdevice through a plurality of processes by means of the manufacturing equipment group.

53. A microdevice manufacturing method according to claim 52, further comprising:

a step of connecting the manufacturing equipment group by a local area network; and

a step of implementing data communication of information about at least one equipment in the manufacturing equipment group, between the local area network and an external network outside the microdevice manufacturing factory.

37. An adjustment method of adjusting an illumination optical apparatus for illuminating a surface to be illuminated, based on light from a light source,

the adjustment method comprising:

a first step of locally changing a polarization state of illumination light on the surface to be illuminated; and

a second step of locally changing a polarization state of light at a position on or near a pupil plane of the illumination optical apparatus.

38. An adjustment method according to claim 37, wherein at least one of the first and second steps has a third step of locally varying a phase of passing light.

39. An adjustment method according to claim 37 or 38, wherein at least one of the first and second steps has a fourth step of variably yielding a polarization rotation angle to incident linearly polarized light.

40. An adjustment method according to any one of claims 37 to 39, further comprising a polarization state measuring step of measuring a polarization state of light reaching the surface to be illuminated,

wherein at least one of the first and second steps comprises effecting each adjustment according to a result of measurement in the polarization state measuring step.

41. An adjustment method according to any one of claims 37 to 40, wherein the first step comprises locally changing a polarization state at any one of the surface to be illuminated, a position near the surface to be illuminated, a position optically conjugate with the surface to be illuminated, and a position near the position optically conjugate with the surface to be illuminated, and

wherein the second step comprises locally changing a polarization state at a position on or near the pupil plane of the illumination optical apparatus.