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Method of fabricating a multi-cornered film

  • US 20070148837A1
  • Filed: 12/27/2005
  • Published: 06/28/2007
  • Est. Priority Date: 12/27/2005
  • Status: Active Grant
First Claim
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1. A method of patterning a film comprising:

  • forming a photoresist mask having a first width on a hard mask film formed on a film;

    patterning said hard mask film in alignment with said photoresist mask to produce a hard mask;

    reducing the width of said photoresist mask to form a reduced width photoresist mask having a second width;

    etching a first portion of said film in alignment with the hard mask;

    etching said hard mask in alignment with said reduced width photoresist mask to form a reduced width hard mask; and

    etching a second portion of said film in alignment with said reduced width hard mask.

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