Integrateable capacitors and microcoils and methods of making thereof
First Claim
1. A method for integrally forming a capacitor and a microcoil on a substrate, the method comprising:
- depositing and patterning a dielectric layer on the substrate;
depositing and patterning a sacrificial layer on the substrate;
depositing and patterning conductive material on the semiconductor substrate, the patterned conductive material including a windings portion of the microcoil, an overlapping electrode portion of the capacitor and a support portion for the electrode of the capacitor;
depositing and patterning a polymer layer on the semiconductor substrate;
removing an exposed portion of the conductive material exposed by the patterned polymer layer to release a portion of the conductive pattern from the semiconductor substrate to form out-of-plane windings of the microcoil;
depositing second conductive material on exposed portions of the conductive material; and
removing the sacrificial layer.
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Accused Products
Abstract
Methods for integrally forming high Q tunable capacitors and high Q inductors on a substrate are described. A method for integrally forming a capacitor and a microcoil on a substrate may involve depositing and patterning a dielectric layer on the substrate, depositing and patterning a sacrificial layer on the substrate, depositing and patterning conductive material on the semiconductor substrate, depositing and patterning a polymer layer on the semiconductor substrate, removing an exposed portion of the conductive material exposed by the patterned polymer layer to release a portion of the conductive pattern from the semiconductor substrate to form out-of-plane windings of the microcoil, depositing second conductive material on exposed portions of the conductive material, and removing the sacrificial layer. The patterned conductive material may include a windings portion of the microcoil, an overlapping electrode portion of the capacitor and a support portion for the electrode of the capacitor.
31 Citations
21 Claims
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1. A method for integrally forming a capacitor and a microcoil on a substrate, the method comprising:
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depositing and patterning a dielectric layer on the substrate;
depositing and patterning a sacrificial layer on the substrate;
depositing and patterning conductive material on the semiconductor substrate, the patterned conductive material including a windings portion of the microcoil, an overlapping electrode portion of the capacitor and a support portion for the electrode of the capacitor;
depositing and patterning a polymer layer on the semiconductor substrate;
removing an exposed portion of the conductive material exposed by the patterned polymer layer to release a portion of the conductive pattern from the semiconductor substrate to form out-of-plane windings of the microcoil;
depositing second conductive material on exposed portions of the conductive material; and
removing the sacrificial layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method for integrally forming a capacitor and a microcoil on a substrate, the method comprising:
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forming and patterning a first dielectric layer on the substrate, depositing and patterning first conductive material on the substrate;
depositing and patterning a second dielectric material on the substrate;
depositing second conductive material on the substrate forming at least a first portion and a second portion;
planarizing an exposed surface of the second conductive material and the patterned second dielectric material;
depositing and patterning a sacrificial layer on the planarized surface;
removing the patterned second dielectric material;
forming third conductive material on the sacrificial layer;
depositing and patterning a polymer layer on the substrate;
removing a portion of the first conductive material exposed by the patterned polymer layer to release a portion of the first conductive material from the substrate to form out-of-plane windings of the microcoil;
depositing fourth conductive material on exposed portions of the first conductive material and the third conductive material;
removing the sacrificial layer;
the first conductive material, the second conductive material and the fourth conductive material each including a first portion and a second portion corresponding to a first winding portion and a second winding portion of the same microcoil; and
the third conductive material forming a capacitance region between the first winding portion and the second winding portion. - View Dependent Claims (10, 11, 12, 13, 14)
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15. A method for integrally forming a capacitance region and a microcoil on a substrate, the method comprising:
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forming a first electrode and a fixed portion of a second electrode associated with the capacitance region on the substrate;
depositing and patterning a sacrificial layer on the first electrode;
depositing and patterning a conductive material on the substrate, the patterning forming a pattern corresponding to windings of the microcoil and a pattern corresponding to a moveable portion of the second electrode, the moveable portion of the second electrode connecting to the fixed portion of the second electrode;
depositing and patterning a mask layer on the substrate;
removing a portion of the deposited and patterned conductive material exposed by the mask layer to release at least a portion of the windings pattern from the substrate to form out-of-plane windings of the microcoil;
depositing a second conductive material on the formed out-of-plane windings of the microcoil and the moveable portion of the second electrode; and
removing the sacrificial layer forming a gap between the first electrode and the second electrode of the capacitor. - View Dependent Claims (16, 17, 18, 19, 20, 21)
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Specification