Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic projection apparatus comprising:
- a programmable patterning structure configured to pattern a radiation beam according to a desired pattern;
a projection system configured to project the patterned radiation beam onto a target portion of a substrate;
a positioning structure configured to move the substrate relative to the projection system during exposure by the patterned radiation beam;
a pivotable mirror configured to move the projected radiation beam relative to the projection system during at least one pulse of the radiation beam; and
an actuator configured to oscillatingly pivot the mirror according to an oscillation timing that substantially corresponds to a pulse frequency of the radiation system, whereby the projected radiation beam is scanned in synchronism with the movement of the substrate during the at least one pulse.
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Abstract
Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned projection beam incident on the substrate in synchronism with the substrate.
81 Citations
27 Claims
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1. A lithographic projection apparatus comprising:
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a programmable patterning structure configured to pattern a radiation beam according to a desired pattern;
a projection system configured to project the patterned radiation beam onto a target portion of a substrate;
a positioning structure configured to move the substrate relative to the projection system during exposure by the patterned radiation beam;
a pivotable mirror configured to move the projected radiation beam relative to the projection system during at least one pulse of the radiation beam; and
an actuator configured to oscillatingly pivot the mirror according to an oscillation timing that substantially corresponds to a pulse frequency of the radiation system, whereby the projected radiation beam is scanned in synchronism with the movement of the substrate during the at least one pulse. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A device manufacturing method, comprising:
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providing a pulsed beam of radiation;
patterning the pulsed beam according to a desired pattern;
projecting the patterned radiation beam onto a target portion of a layer of radiation-sensitive material that at least partially covers a substrate;
moving the substrate relative to a projection system that projects the patterned radiation beam onto the substrate during exposure; and
oscillatingly pivoting a pivotable mirror according to an oscillation timing that substantially corresponds to a pulse frequency of the radiation beam, thereby altering a path of the projected radiation beam relative to the projection system during at least one pulse of the radiation beam, wherein the path is altered in synchronism with the movement of the substrate during the at least one pulse and wherein a cross-section of the patterned radiation beam is projected onto a plane parallel to a surface of the target portion of the substrate. - View Dependent Claims (17, 18, 19, 20, 21, 22)
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23. An apparatus comprising a projection system, said projection system having:
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a pivotable mirror, and an actuator functionally connected to said pivotable mirror;
said actuator being configured to oscillatingly pivot the mirror. - View Dependent Claims (24, 25, 26, 27)
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Specification