APPARATUS FOR REACTIVE SPUTTERING
First Claim
1. A reactive sputtering system comprising:
- a) a vacuum chamber;
b) a reactive ion source that is positioned inside the vacuum chamber, the reactive ion source generating a reactive ion beam from a reactant gas;
c) a sputtering chamber that is positioned in the vacuum chamber, the sputtering chamber comprising a sputter source having a sputtering target that generates sputtering flux, walls that contain an inert gas, and a seal that impedes the reactant gas from entering into the sputtering chamber and that impedes inert gas and sputtered material from escaping into the vacuum chamber; and
d) a transport mechanism that transports a substrate under the reactive ion source and through the sputtering chamber, the substrate being exposed to the reactive ion beam while passing under the reactive ion source and being exposed to sputtering flux while passing through the sputtering chamber.
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Accused Products
Abstract
A reactive sputtering system includes a vacuum chamber and a reactive ion source that is positioned inside the vacuum chamber. The reactive ion source generates a reactive ion beam from a reactant gas. A sputtering chamber is positioned in the vacuum chamber. The sputtering chamber includes a sputter source having a sputtering target that generates sputtering flux, walls that contain an inert gas, and a seal that impedes the reactant gas from entering into the sputtering chamber and that impedes inert gas and sputtered material from escaping into the vacuum chamber. A transport mechanism transports a substrate under the reactive ion source and through the sputtering chamber. The substrate is exposed to the reactive ion beam while passing under the reactive ion source and then is exposed to sputtering flux while passing through the sputtering chamber.
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Citations
35 Claims
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1. A reactive sputtering system comprising:
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a) a vacuum chamber;
b) a reactive ion source that is positioned inside the vacuum chamber, the reactive ion source generating a reactive ion beam from a reactant gas;
c) a sputtering chamber that is positioned in the vacuum chamber, the sputtering chamber comprising a sputter source having a sputtering target that generates sputtering flux, walls that contain an inert gas, and a seal that impedes the reactant gas from entering into the sputtering chamber and that impedes inert gas and sputtered material from escaping into the vacuum chamber; and
d) a transport mechanism that transports a substrate under the reactive ion source and through the sputtering chamber, the substrate being exposed to the reactive ion beam while passing under the reactive ion source and being exposed to sputtering flux while passing through the sputtering chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A method of reactive sputtering, the method comprising:
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a) generating a reactive ion beam from a reactive gas in a vacuum chamber;
b) containing an inert gas within a sputter source positioned inside the vacuum chamber so as to impede the reactant gas from entering into the sputter source;
c) generating sputtering flux from the inert gas contained within the sputter source; and
d) transporting a substrate through the reactive ion beam and through the sputtering flux in the sputter source, thereby reacting the reactive ions with sputtered material deposited on the substrate. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34)
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35. A sputtering system comprising:
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a) a means for generating a reactive ion beam in a vacuum chamber from a reactant gas;
b) a means for containing an inert gas within a sputter source positioned inside the vacuum chamber so as to impede the reactant gas from entering into the sputter source;
c) a means for generating sputtering flux from the inert gas contained within the sputter source; and
d) a means for transporting a substrate through the reactive ion beam and through the sputtering flux in the sputter source, thereby reacting the reactive ions with deposited sputtered material.
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Specification