METHOD FOR MANUFACTURING POLARIZER

• US 20070153161A1
• Filed: 09/05/2006
• Published: 07/05/2007
• Est. Priority Date: 12/30/2005
• Status: Abandoned Application

• Current Assignee: Hon Hai Precision Industry Co., Ltd.
• Original Assignee: Hon Hai Precision Industry Co., Ltd.
• Inventors: CHEN, GA-LANE
• Application Number:
  US11/309,649
• Publication Number:
  US 20070153161A1
• Time in Patent Office: Days
• US Class Current: 349/96
• CPC Class Codes: B29D 11/00865 Applying coatings; tinting; colouring printing, marking or copying processes B41M; identification in general G09F3/00; producing decorative effects in general B44C; positioning or marking of lenses B24B13/0055
• CPC Class Codes: G02B 5/3016 involving passive liquid crystal elements optical properties of liquid crystals G02F1/0063; polarising elements associated with active liquid crystal devices G02F1/133528

Abstract

A method for manufacturing a polarizer includes the steps of: providing an optically anisotropic transparent substrate; defining a plurality of anisotropically shaped grooves in at least one surface of the substrate, the anisotropically shaped grooves being oriented in a same direction; and applying a layer of optically anisotropic transparent material on the at least one surface of the substrate thereby forming a plurality of elongated particles in and aligned with the anisotropically shaped grooves, the elongated particles being configured for inducing shape anisotropy in the substrate.

Claims

1. A method for manufacturing a polarizer, the method comprising the steps of:

providing an optically anisotropic transparent substrate;

defining a plurality of anisotropically shaped grooves in at least one surface of the substrate, the anisotropically shaped grooves being oriented in a same direction; and

applying a layer of optically anisotropic transparent material on the at least one surface of the substrate thereby forming a plurality of elongated particles in and aligned with the anisotropically shaped grooves, the elongated particles being configured for inducing shape anisotropy in the substrate.

2. The method as claimed in claim 1, wherein the substrate is comprised of a material selected from the group consisting of calcite, silicon dioxide, aluminum oxide, and yttrium vanadate crystal.

3. The method as claimed in claim 1, wherein a thickness of the substrate is in a range from 1 to 10 millimeters.

4. The method as claimed in claim 1, wherein each groove is substantially elliptically shaped.

5. The method as claimed in claim 1, wherein a depth of each groove is in a range from 2 to 10 microns.

6. The method as claimed in claim 4, wherein an aspect ratio of each groove is in a range from 2 to 100.

7. The method as claimed in claim 1, wherein the plurality of anisotropically shaped grooves is defined in the at least one surface of the substrate using a laser treatment process.

8. The method as claimed in claim 1, further comprising a step of forming an antireflective coating on the at least one surface of the substrate thereby covering the layer of optically anisotropic transparent material.

9. The method as claimed in claim 8, wherein the antireflective coating comprises a first titanium dioxide coating with a thickness of 10 to 16 nanometers formed on the at least one surface of the substrate, a first silicon dioxide coating with a thickness of 26 to 32 nanometers formed on the first titanium dioxide coating, a second titanium dioxide coating with a thickness of 80 to 120 nanometers formed on the first silicon dioxide coating, and a second silicon dioxide coating with a thickness of 78 to 86 nanometers formed on the second titanium dioxide coating.

10. The method as claimed in claim 8, wherein the antireflective coating is formed by a method selected from the group consisting of electron-beam evaporation, ion-beam evaporation, magnetron sputtering deposition with shadow angle, electron spin resonance deposition, and microwave frequency enhanced deposition.

11. The method as claimed in claim 1, wherein the layer of optically anisotropic transparent material is selected from the group consisting of tin indium oxide, silicon dioxide, aluminum oxide, calcite and yttrium vanadate crystal.