Lithographic apparatus and device manufacturing method using multiple exposures and multiple exposure types
First Claim
Patent Images
1. A lithographic apparatus, comprising:
- at least one array of individually controllable elements that expose a pattern on a substrate, which is configured to perform one or more exposures of a first type and one or more exposures of a second type, wherein, for an exposure of the first type, a beam of radiation is modulated by the at least one array of individually controllable elements and projected onto the substrate, such that a repeating pattern is projected onto the substrate, and wherein, for an exposure of the second type, a beam of radiation is modulated by the at least one array of individually controllable elements and projected onto the substrate, such that the size of a portion of the exposure on the substrate corresponding to an individually controllable element is larger for an exposure of the second type than for an exposure of the first type.
1 Assignment
0 Petitions
Accused Products
Abstract
A lithographic apparatus and method in which a relatively high resolution exposure, for example of a repeating pattern, is trimmed using a relatively low resolution exposure. According, a compromise between provision of a high resolution pattern and flexibility in the pattern to be formed is provided.
53 Citations
47 Claims
-
1. A lithographic apparatus, comprising:
-
at least one array of individually controllable elements that expose a pattern on a substrate, which is configured to perform one or more exposures of a first type and one or more exposures of a second type, wherein, for an exposure of the first type, a beam of radiation is modulated by the at least one array of individually controllable elements and projected onto the substrate, such that a repeating pattern is projected onto the substrate, and wherein, for an exposure of the second type, a beam of radiation is modulated by the at least one array of individually controllable elements and projected onto the substrate, such that the size of a portion of the exposure on the substrate corresponding to an individually controllable element is larger for an exposure of the second type than for an exposure of the first type. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
-
-
12. A device manufacturing method for exposing a pattern on a substrate using a combination of one or more exposures of a first type and one or more exposures of a second type, comprising:
-
for an exposure of the first type, modulating a beam of radiation using a first array of individually controllable elements and projecting the modulated beam onto the substrate, such that a repeating pattern is exposed on the substrate; and
for an exposure of the second type, modulating a beam of radiation using a second array of individually controllable elements and projecting the modulated beam onto the substrate, such that the size of a portion of the exposure on the substrate corresponding to an individually controllable element is larger for an exposure of the second type than for an exposure of the first type. - View Dependent Claims (40, 44)
-
-
13. A lithographic apparatus, comprising:
-
a support that supports a patterning device, the patterning device modulating a beam of radiation to form a first modulated beam of radiation;
an array of individually controllable elements that modulate the first modulated beam of radiation to form a second modulated beam of radiation; and
a projection system that projects the second modulated beam of radiation onto a substrate. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
-
-
24. A device manufacturing method, comprising:
-
using a patterning device to modulate a beam of radiation to form a first modulated beam of radiation;
using an array of individually controllable elements to modulate the first modulated beam of radiation to form a second modulated beam of radiation; and
projecting the second modulated beam of radiation onto a substrate. - View Dependent Claims (41, 45)
-
-
25. A patterning device, comprising:
-
an array of individually controllable elements that modulate a beam of radiation according to a repeating pattern;
wherein the array is configured to receive a control signal indicating that the repeating pattern is to be provided and, in response, to set the individually controllable elements to states necessary to modulate the beam of radiation according to the repeating pattern. - View Dependent Claims (26, 27, 28, 29)
-
-
30. A device manufacturing method, comprising:
-
receiving a control signal at an array of individually controllable elements;
indicating with the control signal that the array of individually controllable elements is to be set to modulate a beam of radiation according to a repeating pattern; and
modulating the beam of radiation using the array of individually controllable elements. - View Dependent Claims (42, 46)
-
-
31. A lithographic apparatus, comprising:
-
an array of individually controllable elements that modulate a beam of radiation, the individually controllable elements comprising patterning surfaces that impart a pattern to a portion of the modulated beam of radiation corresponding to the individually controllable elements; and
a projection system that projects the modulated beam of radiation onto a substrate. - View Dependent Claims (32, 33, 34, 35, 36, 37)
-
-
38. A patterning device, comprising:
array of individually controllable elements that modulate a beam of radiation, the individually controllable elements include patterning surfaces that impart a given pattern to a portion of the modulated beam of radiation corresponding to the individually controllable element.
-
39. A device manufacturing method, comprising:
-
modulating a beam of radiation using an array of individually controllable elements;
using patterning surfaces of the individually controllable elements to impart a given pattern to a portion of the modulated beam of radiation corresponding to the individually controllable element; and
projecting the modulated beam of radiation onto a substrate. - View Dependent Claims (43, 47)
-
Specification