Interferometric lithography system and method used to generate equal path lengths of interfering beams
First Claim
1. A method to write patterns onto an exposure field on a substrate, comprising:
- directing first and second temporally coherent and spatially coherent beams of radiation to substantially overlap in the exposure field on the substrate, such that the first and second beams form interference fringes;
adjusting a beam width of the first and second beams, such that respective path lengths of the beams are matched when they reach the exposure field to ensure the first and second beams are mutually spatially coherent and temporally coherent across a full width of the exposure field.
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Accused Products
Abstract
A system and method are provided for writing patterns onto substrates. First and second beams are directed to converge and substantially overlap in a common region on a substrate. This can be done so that the first and second beams are mutually temporally coherent and spatially coherent in the region of overlap to form interference fringes to define a writing image. A beam width of the first and second beams is adjusted. This can be done so that respective path lengths of the beams are matched when they reach the common region to ensure the first and second beams are mutually spatially coherent and temporally coherent across an entire width of the common region. In one example, the substrate is moved with respect to the writing image, while writing patterns onto the substrate. In another example, the substrate remains stationary.
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Citations
33 Claims
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1. A method to write patterns onto an exposure field on a substrate, comprising:
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directing first and second temporally coherent and spatially coherent beams of radiation to substantially overlap in the exposure field on the substrate, such that the first and second beams form interference fringes;
adjusting a beam width of the first and second beams, such that respective path lengths of the beams are matched when they reach the exposure field to ensure the first and second beams are mutually spatially coherent and temporally coherent across a full width of the exposure field. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A system for writing a pattern onto an exposure field on a substrate, comprising:
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an optical directing device that directs first and second spatially coherent and temporally coherent beams of radiation to substantially overlap at the exposure field, such that overlapping beams form interference fringes in the exposure field; and
first and second beam width adjusting systems located in respective beam paths of the first and second light beams, such that respective path lengths of the beams are matched when they reach the exposure field to maintain the spatial coherence and temporal coherence of the beams across a full width of the exposure field. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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27. A system, comprising:
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a beam splitter that splits a beam of radiation into first and second beams;
first and second beam width adjusting systems that receive respective ones of the first and second beams and output respective first and second beam width adjusted beams; and
first and second reflectors that direct the first and second beam width adjusted beams to interfere at an exposure field of a substrate, such that fringes formed by the interference form an image on the substrate. - View Dependent Claims (28, 29, 30, 31, 32, 33)
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Specification