METHODS OF FABRICATING VERTICAL JFET LIMITED SILICON CARBIDE METAL-OXIDE SEMICONDUCTOR FIELD EFFECT TRANSISTORS
First Claim
1. A method of fabricating a silicon carbide metal-oxide semiconductor field effect transistor unit cell comprising:
- forming an n-type silicon carbide drift layer;
forming a first p-type silicon carbide region adjacent the drift layer;
forming a first n-type silicon carbide region within the first p-type silicon carbide region;
forming an oxide layer on the drift layer; and
forming an n-type silicon carbide limiting region between the drift layer and a portion of the first p-type silicon carbide region, wherein the n-type limiting region has a carrier concentration that is greater than a carrier concentration of the drift layer.
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Abstract
Silicon carbide metal-oxide semiconductor field effect transistors (MOSFETs) may include an n-type silicon carbide drift layer, a first p-type silicon carbide region adjacent the drift layer and having a first n-type silicon carbide region therein, an oxide layer on the drift layer, and an n-type silicon carbide limiting region disposed between the drift layer and a portion of the first p-type region. The limiting region may have a carrier concentration that is greater than the carrier concentration of the drift layer. Methods of fabricating silicon carbide MOSFET devices are also provided.
114 Citations
30 Claims
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1. A method of fabricating a silicon carbide metal-oxide semiconductor field effect transistor unit cell comprising:
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forming an n-type silicon carbide drift layer;
forming a first p-type silicon carbide region adjacent the drift layer;
forming a first n-type silicon carbide region within the first p-type silicon carbide region;
forming an oxide layer on the drift layer; and
forming an n-type silicon carbide limiting region between the drift layer and a portion of the first p-type silicon carbide region, wherein the n-type limiting region has a carrier concentration that is greater than a carrier concentration of the drift layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method of fabricating a silicon carbide metal-oxide semiconductor field effect transistor, comprising the steps of:
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forming a drift layer of n-type silicon carbide;
forming first regions of p-type silicon carbide adjacent the drift layer;
forming a first region of n-type silicon carbide between peripheral edges of the first regions of p-type silicon carbide;
forming second regions of n-type silicon carbide in the first regions of p-type silicon carbide, wherein the second regions of n-type silicon carbide have a carrier concentration greater than a carrier concentration of the drift layer and are spaced apart from the peripheral edges of the first regions of p-type silicon carbide;
forming an oxide layer on the drift layer, the first region of n-type silicon carbide and the second regions of n-type silicon carbide; and
forming third regions of n-type silicon carbide between the first regions of p-type silicon carbide and the drift layer, wherein the third regions of n-type silicon carbide have a carrier concentration greater than the carrier concentration of the drift layer;
forming source contacts on portions of the second regions of n-type silicon carbide;
forming a gate contact on the oxide layer; and
forming a drain contact on the drift layer opposite the oxide layer. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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27. A method of fabricating a silicon carbide metal-oxide semiconductor field effect transistor comprising:
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forming an n-type silicon carbide drift layer;
forming spaced apart p-type silicon carbide well regions; and
forming an n-type silicon carbide limiting region between the well regions and the drift layer. - View Dependent Claims (28, 29, 30)
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Specification