Pattern forming method, pattern forming apparatus, and device manufacturing method

US 20070159632A1
Filed: 12/28/2006
Published: 07/12/2007
Est. Priority Date: 12/28/2005
Status: Active Grant

First Claim

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1. A pattern forming method of forming a pattern on an object, the method comprising:

a first process of detecting a mark while the object is being moved, with at least a part of a mark detection system also being moved; and

a second process of forming a pattern on the object using detection results of the mark.

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Abstract

To improve the throughput of the entire exposure process. [SOLUTION]

While wafer stage WST moves from a loading position where wafer W on wafer stage WST is exchanged to an exposure starting position where exposure of a wafer begins, at least a part of alignment systems ALG1 and ALG2 are moved and marks on wafer W are detected using alignment systems ALG1 and ALG2. Accordingly, time for mark detection does not have to be arranged separately from the movement time of the stage from the loading position to the exposure starting position, as in the conventional apparatus. Therefore, it becomes possible to increase the throughput of the entire exposure process.

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221 Claims

1. A pattern forming method of forming a pattern on an object, the method comprising:
- a first process of detecting a mark while the object is being moved, with at least a part of a mark detection system also being moved; and
  
  a second process of forming a pattern on the object using detection results of the mark.
- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 86, 87, 88, 89, 90)
- - 2. The pattern forming method of claim 1 wherein the object is moved by moving a moving section that holds the object.
  - 3. The pattern forming method of claim 2 wherein the detection of the mark is performed while the moving section moves at least from a loading position where object is held by the moving section to a position where pattern forming with respect to the object begins.
  - 4. The pattern forming method of claim 1 wherein the detection of the mark is performed at least after the beginning of pattern forming with respect to the object.
  - 5. The pattern forming method of claim 4 wherein the detection of the mark is performed also before the beginning of pattern forming with respect to the object.
  - 6. The pattern forming method in of claim 1 wherein in the first process, a plurality of marks are detected while changing a position relation between the object and the mark detection system.
  - 7. The pattern forming method of claim 1 wherein in the first process, after a mark detection, at least a part of the mark detection system moves in a direction different from a movement direction of the object until the next mark is detected.
  - 8. The pattern forming method of claim 1 wherein in the first process, a part of the marks necessary for forming a pattern on all divided areas subject to pattern forming on the object are detected, and the method further comprises:
    - a third process of detecting the rest of the marks necessary for forming a pattern on all the divided areas subject to pattern forming, which is performed in parallel with the second process where a pattern is formed on a divided area on which a pattern can be formed, based on the detection results of the marks in the first process.
  - 9. The pattern forming method of claim 1 wherein on the pattern forming, positional information of the mark detection system and positional information of the object are used.
  - 10. The pattern forming method of claim 1 wherein positional information of the mark is detected based on positional information of the mark detection system and positional information of the object.
  - 11. The pattern forming method of claim 1 wherein on the pattern forming, rotational information of the mark detection system is used.
  - 12. The pattern forming method of claim 1 wherein positional information of the mark is detected based on positional information and rotational information of the mark detection system and positional information of the object.
  - 13. The pattern forming method of claim 1 wherein in the first process, the plurality of marks are detected using a plurality of the mark detection system.
  - 14. The pattern forming method of claim 1 wherein in the first process, the mark is detected in a state where the object and the mark detection system are relatively stationary.
  - 86. The pattern forming method of claim 1 wherein information related to the surface shape of the object is detected while the object is being moved by a detection system different from the mark detection system, and the detection results are used in the pattern forming.
  - 87. The pattern forming method of claim 86 wherein at least a part of a detection operation of the information related to the surface shape is performed in parallel with a detection operation of the mark.
  - 88. The pattern forming method of claim 1 wherein a pattern is formed by exposing the object.
  - 89. The pattern forming method of claim 88 wherein liquid immersion exposure is performed on the object.
  - 90. A device manufacturing method including a process of forming a pattern on a sensitive object using the pattern forming method of claim 1.

15-85. -85. (canceled)

91. A pattern forming method of forming a pattern on an object, the method comprising:
- a first process of detecting a mark on the object while the object is being moved, with a detection area of a mark detection system also being moved; and
  
  a second process of forming a pattern on the object using detection results of the mark.
- View Dependent Claims (92, 93, 94, 95, 96, 97, 98, 99, 100, 101)
- - 92. The pattern forming method of claim 91 wherein in the first process, the object is moved in a first direction in which a plurality of divided areas on which a pattern is to be formed are disposed on the object.
  - 93. The pattern forming method of claim 92 wherein in the first process, a plurality of marks are detected whose position in the first direction is different on the object.
  - 94. The pattern forming method of claim 92 wherein in the first process, marks on the object are detected by a plurality of mark detection systems that have detection areas of different positions in a second direction orthogonal to the first direction.
  - 95. The pattern forming method of claim 94 wherein in the first process, marks of different positions in the second direction on the object are detected by changing the distance of the plurality of detection areas in the second direction.
  - 96. The pattern forming method of claim 91 wherein in the second process, detection results of the mark on the object by the mark detection system after the beginning of pattern forming with respect to the object are also used.
  - 97. The pattern forming method of claim 91 wherein information related to the surface shape of the object is detected while the object is being moved by a detection system different from the mark detection system, and the detection results are used in the pattern forming.
  - 98. The pattern forming method of claim 97 wherein at least a part of a detection operation of the information related to the surface shape is performed in parallel with a detection operation of the mark.
  - 99. The pattern forming method of claim 91 wherein a pattern is formed by exposing the object.
  - 100. The pattern forming method of claim 99 wherein liquid immersion exposure is performed on the object.
  - 101. A device manufacturing method including a process of forming a pattern on a sensitive object using the pattern forming method of claim 91.

102. A pattern forming method of forming a pattern on an object wherein a mark on the object is detected by a mark detection system, and pattern forming with respect to the object begins using the detection results, whereby a mark on the object is detected by the mark detection system even after the beginning of pattern forming, and the detection results are used in the pattern forming.
- View Dependent Claims (103, 104, 105, 106, 107, 108, 109, 110, 111, 112, 113, 114, 115, 116, 117, 118, 119, 120, 121)
- - 103. The pattern forming method of claim 102 wherein a pattern is formed in each of a plurality of divided areas on the object, and among the plurality of divided areas, in a first group of divided areas including a divided area on which the pattern is formed first, detection results of the mark detected before the beginning of pattern forming are used, and in a second group of divided areas different from the first group of divided areas, detection results of the mark detected after the beginning of pattern forming are used.
  - 104. The pattern forming method of claim 103 wherein in the second group of divided areas, detection results of the mark detected before the beginning of pattern forming are also used.
  - 105. The pattern forming method of claim 103 wherein the pattern forming on the second group of divided areas is performed later than the pattern forming of the first group of divided areas.
  - 106. The pattern forming method of claim 102 wherein before the beginning of pattern forming, the object is moved in a first direction and a plurality of marks of different positions in the first direction are detected.
  - 107. The pattern forming method of claim 106 wherein marks on the object are detected by a plurality of mark detection systems that have detection areas of different positions in a second direction orthogonal to the first direction.
  - 108. The pattern forming method of claim 107 wherein marks of different positions in the second direction on the object are detected by changing the distance of the plurality of detection areas in the second direction.
  - 109. The pattern forming method claim 106 wherein information related to the surface shape of the object is detected while the object is being moved by a detection system different from the mark detection system, and the detection results are used in the pattern forming.
  - 110. The pattern forming method of claim 109 wherein at least a part of a detection operation of the information related to the surface shape is performed in parallel with a detection operation of the mark.
  - 111. The pattern forming method of claim 102 wherein before the beginning of pattern forming, the object is moved in a first direction in which a plurality of divided areas on which a pattern is to be formed are disposed on the object, and a plurality of marks of different positions in the first direction are detected.
  - 112. The pattern forming method of claim 111 wherein marks on the object are detected by a plurality of mark detection systems that have detection areas of different positions in a second direction orthogonal to the first direction.
  - 113. The pattern forming method of claim 112 wherein marks of different positions in the second direction on the object are detected by changing the distance of the plurality of detection areas in the second direction.
  - 114. The pattern forming method of claim 111 wherein information related to the surface shape of the object is detected while the object is being moved by a detection system different from the mark detection system, and the detection results are used in the pattern forming.
  - 115. The pattern forming method of claim 114 wherein at least a part of a detection operation of the information related to the surface shape is performed in parallel with a detection operation of the mark.
  - 116. The pattern forming method of claim 102 wherein detection of the marks is performed moving the detection area while the object is being moved.
  - 117. The pattern forming method of claim 116 wherein information related to the surface shape of the object is detected while the object is being moved by a detection system different from the mark detection system, and the detection results are used in the pattern forming.
  - 118. The pattern forming method of claim 117 wherein at least a part of a detection operation of the information related to the surface shape is performed in parallel with a detection operation of the mark.
  - 119. The pattern forming method of claim 102 wherein a pattern is formed by exposing the object.
  - 120. The pattern forming method of claim 119 wherein liquid immersion exposure is performed on the object.
  - 121. A device manufacturing method including a process of forming a pattern on a sensitive object using the pattern forming method of claim 102.

122. A pattern forming method of forming a pattern on an object wherein the object is moved in a first direction, and a plurality of marks that have different positions in the first direction on the object are each detected by a plurality of mark detection systems that have detection areas of different positions in a second direction orthogonal to the first direction, and information related to the surface shape of the object is also detected by a detection system different from the mark detection system, whereby a pattern is formed on the object using the two detection results.
- View Dependent Claims (123, 124, 125, 126, 127, 128, 129)
- - 123. The pattern forming method of claim 122 wherein the plurality of marks include marks of different positions in the second direction, and detection areas of the plurality of mark detection systems are moved in the second direction.
  - 124. The pattern forming method of claim 122 wherein detection of each of the marks is performed moving the detection area while the object is being moved.
  - 125. The pattern forming method of claim 122 wherein a detection area of the detection system different is disposed between the position where the pattern forming is performed and the detection area of the mark detection system in the first direction.
  - 126. The pattern forming method claim 122 wherein at least a part of a detection operation of the information related to the surface shape is performed in parallel with a detection operation of the mark.
  - 127. The pattern forming method of claim 122 wherein a pattern is formed by exposing the object.
  - 128. The pattern forming method of claim 127 wherein liquid immersion exposure is performed on the object.
  - 129. A device manufacturing method including a process of forming a pattern on a sensitive object using the pattern forming method of claim 122.

130. A pattern forming apparatus that forms a pattern on an object held by a moving section, the apparatus comprising:
- a mark detection system that can have at least a part of the system moved; and
  
  a control unit that moves at least a part of the mark detection system so as to detect a mark on the object with the mark detection system while the moving section is being moved.
- View Dependent Claims (131, 132, 133, 134, 135, 136, 137, 138, 139, 140, 141, 142, 143, 144, 145, 146, 147, 148, 149, 150, 151, 152, 153, 154, 155, 156, 157, 158)
- - 131. The pattern forming apparatus of claim 130 wherein a pattern is formed on the object using detection results of the mark.
  - 132. The pattern forming apparatus of claim 130 wherein the control unit controls a movement of at least a part of the mark detection system so that detection of the mark is performed while the moving section is being moved at least from a loading position where the moving section holds the object to a position where pattern forming with respect to the object begins.
  - 133. The pattern forming apparatus of claim 130 wherein the control unit controls a movement of at least a part of the mark detection system so that detection of the mark is performed at least after pattern forming has begun on the object.
  - 134. The pattern forming apparatus of claim 133 wherein the control unit controls a movement of at least a part of the mark detection system so that detection of the mark is performed also before the beginning of pattern forming with respect to the object.
  - 135. The pattern forming apparatus of claim 130 wherein the control unit controls a movement of at least a part of the mark detection system so that at least a part of the mark detection system follows the movement of the moving section when detecting the mark on the object.
  - 136. The pattern forming apparatus of claim 130 wherein the control unit detects a plurality of marks on the object while changing the positional relation between the object and the mark detection system.
  - 137. The pattern forming apparatus of claim 130 wherein the control unit moves at least a part of the mark detection system in a direction different from a movement direction of the object after a mark detection until the next mark detection.
  - 138. The pattern forming apparatus of claim 130 wherein the control unit detects a part of the marks necessary for forming a pattern on all divided areas subject to pattern forming on the object, and also detects the rest of the marks necessary for forming a pattern on all divided areas subject to pattern forming, in parallel with forming a pattern on a divided area on which a pattern can be formed based on the detection results of a part of the marks necessary for forming the pattern.
  - 139. The pattern forming apparatus of claim 130 wherein the mark detection system has a photodetection element and a cooling mechanism for cooling the photodetection element.
  - 140. The pattern forming apparatus of claim 130, the apparatus further comprising:
    - a sensor that detects positional information of the mark detection system, whereby the positional information of the mark detection system and positional information of the object are used on pattern forming.
  - 141. The pattern forming apparatus of claim 140 wherein positional information of the mark is detected based on the positional information of the mark detection system detected by the sensor and the positional information of the object.
  - 142. The pattern forming apparatus of claim 140 wherein the sensor also detects rotational information of the mark detection system, whereby the rotational information of the mark detection system is used on pattern forming.
  - 143. The pattern forming apparatus of claim 142 wherein positional information of the mark is detected based on the positional information and the rotational information of the mark detection system detected by the sensor and the positional information of the object.
  - 144. The pattern forming apparatus of claim 140 wherein the sensor includes an interferometer.
  - 145. The pattern forming apparatus of claims 130, the apparatus further comprising:
    - a detection unit that detects positional information of the object in a direction perpendicular to a predetermined plane on which the object moves at a each of a plurality of measurement positions disposed between a loading position where the moving section holds the object and a pattern forming starting position with respect to the object.
  - 146. The pattern forming apparatus of claim 145 wherein the control unit computes information related to the surface shape of the object based on detection results of the detection unit.
  - 147. The pattern forming apparatus of claim 145 wherein the control unit performs at least a part of a detection operation by the detection unit in parallel with a detection operation of the mark.
  - 148. The pattern forming apparatus of claim 130, the apparatus further comprising:
    - a measurement moving section that can move independently from the moving section, and performs measurement necessary for the pattern forming while the object on the moving section is exchanged.
  - 149. The pattern forming apparatus of claim 130, the apparatus further comprising:
    - a separate moving section that can move independently from the moving section, and holds the object on which detection of the mark is performed by the mark detection system while pattern forming is performed with respect to the object held by the moving section.
  - 150. The pattern forming apparatus of claim 130, the apparatus further comprising:
    - an optical system that irradiates an illumination light on the object, whereby a pattern is formed by exposing the object with the illumination light.
  - 151. The pattern forming apparatus of claim 150 wherein the mark detection system is separated in a vibrating manner from a body that supports the optical system.
  - 152. The pattern forming apparatus of claim 151, the apparatus further comprising:
    - a sensor that detects positional information of the mark detection system with the body serving as a reference.
  - 153. The pattern forming apparatus of claim 152 wherein the sensor includes an interferometer, and of the interferometer, at least a branching optical system that branches light into a reference beam and a measurement beam moves with at least a part of the mark detection system, and a reflection surface on which the measurement beam is incident is arranged on the body.
  - 154. The pattern forming apparatus of claim 150 wherein the optical system includes a projection optical system that projects a pattern on the object, and at least the projection optical system is supported by the body.
  - 155. The pattern forming apparatus of claim 154, the apparatus further comprising:
    - a sensor that detects positional information of the mark detection system with the body serving as a reference.
  - 156. The pattern forming apparatus of claim 155 wherein the sensor includes an interferometer, and of the interferometer, at least a branching optical system that branches light into a reference beam and a measurement beam moves with at least a part of the mark detection system, and a reflection surface on which the measurement beam is incident is arranged on the body.
  - 157. The pattern forming apparatus of claim 150, the apparatus further comprising:
    - a liquid supply mechanism that supplies liquid in a space between the optical system and the object, whereby the object is exposed with the illumination light via the optical system and the liquid.
  - 158. A device manufacturing method including a process of forming a pattern on a sensitive object using the pattern forming apparatus of claim 130.

159. A pattern forming apparatus that forms a pattern on an object held by a moving section, the apparatus comprising:
- a mark detection system that can have at least a part of the system moved; and
  
  a control unit that controls a movement of a detection area of the mark detection system so as to detect a mark on the object with the mark detection system while the moving section is being moved.
- View Dependent Claims (160, 161, 162, 163, 164, 165, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 178, 179)
- - 160. The pattern forming apparatus of claim 159 wherein the control unit moves the moving section in a first direction where a plurality of divided areas on which a pattern is to be formed are disposed on the object, in parallel with moving the detection area of the mark detection system.
  - 161. The pattern forming apparatus of claim 160 wherein the mark detection system detects a plurality of marks of different positions in the first direction.
  - 162. The pattern forming apparatus of claim 160, the apparatus comprising:
    - a plurality of the mark detection systems, whereby each of the mark detection systems have detection areas of different positions in a second direction orthogonal to the first direction.
  - 163. The pattern forming apparatus of claim 162 wherein the control unit detects marks of different positions in the second direction on the object by changing the distance of the plurality of detection areas in the second direction on detection of the marks on the object with the mark detection system while the moving section is being moved.
  - 164. The pattern forming apparatus of claim 159 wherein the control unit forms a pattern on the object using detection results of the mark.
  - 165. The pattern forming apparatus of claim 164 wherein the control unit uses the detection results of the mark on the object by the mark detection system after the beginning of pattern forming with respect to the object.
  - 166. The pattern forming apparatus of claim 159, the apparatus further comprising:
    - a detection unit that detects positional information of the object in a direction perpendicular to a predetermined plane on which the object moves at a each of a plurality of measurement positions disposed between a loading position where the moving section holds the object and a pattern forming starting position with respect to the object.
  - 167. The pattern forming apparatus of claim 166 wherein the control unit computes information related to the surface shape of the object based on detection results of the detection unit.
  - 168. The pattern forming apparatus of claim 166 wherein the control unit performs at least a part of a detection operation by the detection unit in parallel with a detection operation of the mark.
  - 169. The pattern forming apparatus of claim 159, the apparatus further comprising:
    - a measurement moving section that can move independently from the moving section, and performs measurement necessary for the pattern forming while the object on the moving section is exchanged.
  - 170. The pattern forming apparatus of claim 159, the apparatus further comprising:
    - a separate moving section that can move independently from the moving section, and holds the object on which detection of the mark is performed by the mark detection system while pattern forming is performed with respect to the object held by the moving section.
  - 171. The pattern forming apparatus of claim 159, the apparatus further comprising:
    - an optical system that irradiates an illumination light on the object, whereby a pattern is formed by exposing the object with the illumination light.
  - 172. The pattern forming apparatus of claim 171 wherein the mark detection system is separated in a vibrating manner from a body that supports the optical system.
  - 173. The pattern forming apparatus of claim 172, the apparatus further comprising:
    - a sensor that detects positional information of the mark detection system with the body serving as a reference.
  - 174. The pattern forming apparatus of claim 173 wherein the sensor includes an interferometer, and of the interferometer, at least a branching optical system that branches light into a reference beam and a measurement beam moves with at least a part of the mark detection system, and a reflection surface on which the measurement beam is incident is arranged on the body.
  - 175. The pattern forming apparatus of claim 171 wherein the optical system includes a projection optical system that projects a pattern on the object, and at least the projection optical system is supported by the body.
  - 176. The pattern forming apparatus of claim 175, the apparatus further comprising:
    - a sensor that detects positional information of the mark detection system with the body serving as a reference.
  - 177. The pattern forming apparatus of claim 176 wherein the sensor includes an interferometer, and of the interferometer, at least a branching optical system that branches light into a reference beam and a measurement beam moves with at least a part of the mark detection system, and a reflection surface on which the measurement beam is incident is arranged on the body.
  - 178. The pattern forming apparatus of claim 171, the apparatus further comprising:
    - a liquid supply mechanism that supplies liquid in a space between the optical system and the object, whereby the object is exposed with the illumination light via the optical system and the liquid.
  - 179. A device manufacturing method including a process of forming a pattern on a sensitive object using the pattern forming apparatus of claim 159.

180. A pattern forming apparatus that forms a pattern on an object held by a moving section, the apparatus comprising:
- a mark detection system that detects a mark on the object; and
  
  a control unit that controls detection of the mark on the object using the mark detection system and pattern forming with respect to the object, wherein the control unit detects the mark on the object with the mark detection system and begins pattern forming with respect to the object using the detection results, and after the beginning of pattern forming, continues to detect the mark on the object with the mark detection system and uses the detection results in the pattern forming.
- View Dependent Claims (181, 182, 183, 184, 185, 186, 187, 188, 189, 190, 191, 192, 193, 194, 195, 196, 197, 198, 199, 200, 201, 202, 203, 204, 205)
- - 181. The pattern forming apparatus of claim 180 wherein the object has a plurality of divided areas in which a pattern is formed, and the control unit uses detection results of the mark detected before the beginning of pattern forming when forming a pattern with respect to a first group of divided areas including a divided area on which the pattern is formed first among the plurality of divided areas, and detection results of the mark detected after the beginning of pattern forming when forming a pattern with respect to a second group of divided areas different from the first group of divided areas.
  - 182. The pattern forming apparatus of claim 181 wherein the control unit also uses detection results of a mark detected before the beginning of pattern forming when forming a pattern with respect to the second group of divided areas.
  - 183. The pattern forming apparatus of claim 181 wherein the pattern forming on the second group of divided areas is performed later than the pattern forming of the first group of divided areas.
  - 184. The pattern forming apparatus of claim 180 wherein the control unit moves the moving section in a first direction before the beginning of pattern forming, and detects a plurality of marks of different positions in the first direction on the object.
  - 185. The pattern forming apparatus of claim 184, the apparatus comprising:
    - a plurality of the mark detection systems, whereby each of the mark detection systems have detection areas of different positions in a second direction orthogonal to the first direction.
  - 186. The pattern forming apparatus of claim 185 wherein the control unit detects marks of different positions in the second direction on the object by changing the distance of the plurality of detection areas in the second direction.
  - 187. The pattern forming apparatus of claim 180 wherein the control unit moves the moving section in a first direction in which a plurality of divided areas on which a pattern is to be formed are disposed on the object before the beginning of pattern forming, and detects a plurality of marks of different positions in the first direction.
  - 188. The pattern forming apparatus of claim 187, the apparatus comprising:
    - a plurality of the mark detection systems, whereby each of the mark detection systems have detection areas of different positions in a second direction orthogonal to the first direction.
  - 189. The pattern forming apparatus of claim 188 wherein the control unit detects marks of different positions in the second direction on the object by changing the distance of the plurality of detection areas in the second direction.
  - 190. The pattern forming apparatus of claim 180 wherein the control unit performs detection of the mark moving the detection area while the object is being moved.
  - 191. The pattern forming apparatus of claim 190 wherein the control unit performs at least a part of a detection operation by the detection unit in parallel with a detection operation of the mark.
  - 192. The pattern forming apparatus of claim 180, the apparatus further comprising:
    - a detection unit that detects positional information of the object in a direction perpendicular to a predetermined plane on which the object moves at a each of a plurality of measurement positions disposed between a loading position where the moving section holds the object and a pattern forming starting position with respect to the object.
  - 193. The pattern forming apparatus of claim 192 wherein the control unit computes information related to the surface shape of the object based on detection results of the detection unit.
  - 194. The pattern forming apparatus of claim 192 wherein the control unit performs at least a part of a detection operation by the detection unit in parallel with a detection operation of the mark.
  - 195. The pattern forming apparatus of claim 180, the apparatus further comprising:
    - a measurement moving section that can move independently from the moving section, and performs measurement necessary for the pattern forming while the object on the moving section is exchanged.
  - 196. The pattern forming apparatus of claim 180, the apparatus further comprising:
    - a separate moving section that can move independently from the moving section, and holds the object on which detection of the mark is performed by the mark detection system while pattern forming is performed with respect to the object held by the moving section.
  - 197. The pattern forming apparatus of claim 180, the apparatus further comprising:
    - an optical system that irradiates an illumination light on the object, whereby a pattern is formed by exposing the object with the illumination light.
  - 198. The pattern forming apparatus of claim 197 wherein the mark detection system is separated in a vibrating manner from a body that supports the optical system.
  - 199. The pattern forming apparatus of claim 198, the apparatus further comprising:
    - a sensor that detects positional information of the mark detection system with the body serving as a reference.
  - 200. The pattern forming apparatus of claim 199 wherein the sensor includes an interferometer, and of the interferometer, at least a branching optical system that branches light into a reference beam and a measurement beam moves with at least a part of the mark detection system, and a reflection surface on which the measurement beam is incident is arranged on the body.
  - 201. The pattern forming apparatus of claim 197 wherein the optical system includes a projection optical system that projects a pattern on the object, and at least the projection optical system is supported by the body.
  - 202. The pattern forming apparatus of claim 201, the apparatus further comprising:
    - a sensor that detects positional information of the mark detection system with the body serving as a reference.
  - 203. The pattern forming apparatus of claim 202 wherein the sensor includes an interferometer, and of the interferometer, at least a branching optical system that branches light into a reference beam and a measurement beam moves with at least a part of the mark detection system, and a reflection surface on which the measurement beam is incident is arranged on the body.
  - 204. The pattern forming apparatus of claim 197, the apparatus further comprising:
    - a liquid supply mechanism that supplies liquid in a space between the optical system and the object, whereby the object is exposed with the illumination light via the optical system and the liquid.
  - 205. A device manufacturing method including a process of forming a pattern on a sensitive object using the pattern forming apparatus of claim 180.

206. A pattern forming apparatus that forms a pattern on an object held by a moving section that moves in at least a first direction, the apparatus comprising:
- a plurality of mark detection systems that have detection areas of different positions in a second direction orthogonal to the first direction;
  
  a detection unit that detects information related to the surface shape of the object; and
  
  a control unit that detects a plurality of marks whose position is different in the first direction on the object using each of the plurality of mark detection systems and also detects information related to the surface shape of the object using the detection unit, and forms a pattern on the object using the two detection results while moving the moving section in the first direction.
- View Dependent Claims (207, 208, 209, 210, 211, 212, 213, 214, 215, 216, 217, 218, 219, 220, 221)
- - 207. The pattern forming apparatus of claim 206 wherein the plurality of marks includes marks whose positions differ in the second direction, and the control unit moves each of the detection areas of the plurality of mark detection systems in the second direction on detection of the marks.
  - 208. The pattern forming apparatus of claim 206 wherein the control unit moves the detection area while the moving section is being moved on detection of each of the marks.
  - 209. The pattern forming apparatus of claim 206 wherein a detection area of the detection unit is disposed between a position where the pattern forming is performed and the detection areas of the mark detection systems in the first direction.
  - 210. The pattern forming apparatus of claim 206 wherein the control unit performs at least a part of a detection operation by the detection unit in parallel with a detection operation of the mark.
  - 211. The pattern forming apparatus of claim 206, the apparatus further comprising:
    - a measurement moving section that can move independently from the moving section, and performs measurement necessary for the pattern forming while the object on the moving section is exchanged.
  - 212. The pattern forming apparatus of claim 206, the apparatus further comprising:
    - a separate moving section that can move independently from the moving section, and holds the object on which detection of the mark is performed by the mark detection system while pattern forming is performed with respect to the object held by the moving section.
  - 213. The pattern forming apparatus of claim 206, the apparatus further comprising:
    - an optical system that irradiates an illumination light on the object, whereby a pattern is formed by exposing the object with the illumination light.
  - 214. The pattern forming apparatus of claim 213 wherein the mark detection system is separated in a vibrating manner from a body that supports the optical system.
  - 215. The pattern forming apparatus of claim 214, the apparatus further comprising:
    - a sensor that detects positional information of the mark detection system with the body serving as a reference.
  - 216. The pattern forming apparatus of claim 215 wherein the sensor includes an interferometer, and of the interferometer, at least a branching optical system that branches light into a reference beam and a measurement beam moves with at least a part of the mark detection system, and a reflection surface on which the measurement beam is incident is arranged on the body.
  - 217. The pattern forming apparatus of claim 213 wherein the optical system includes a projection optical system that projects a pattern on the object, and at least the projection optical system is supported by the body.
  - 218. The pattern forming apparatus of claim 217, the apparatus further comprising:
    - a sensor that detects positional information of the mark detection system with the body serving as a reference.
  - 219. The pattern forming apparatus of claim 218 wherein the sensor includes an interferometer, and of the interferometer, at least a branching optical system that branches light into a reference beam and a measurement beam moves with at least a part of the mark detection system, and a reflection surface on which the measurement beam is incident is arranged on the body.
  - 220. The pattern forming apparatus of claim 213, the apparatus further comprising:
    - a liquid supply mechanism that supplies liquid in a space between the optical system and the object, whereby the object is exposed with the illumination light via the optical system and the liquid.
  - 221. A device manufacturing method including a process of forming a pattern on a sensitive object using the pattern forming apparatus of claim 206.

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Current Assignee
Nikon Corporation
Original Assignee
Nikon Corporation
Inventors
Shibazaki, Yuichi

Granted Patent

US 8,411,271 B2
Time in Patent Office

Days
Field of Search
US Class Current

356/401
CPC Class Codes

G03F 7/70733 Handling masks and workpiec...

G03F 9/7003 Alignment type or strategy,...

Pattern forming method, pattern forming apparatus, and device manufacturing method

First Claim

1 Assignment

0 Petitions

Accused Products

Abstract

52 Citations

221 Claims

Specification

Use Cases

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Others

Pattern forming method, pattern forming apparatus, and device manufacturing method

First Claim

1 Assignment

Subscription Required

Subscription Required

0 Petitions

Subscription Required

Accused Products

Subscription Required

Abstract

52 Citations

221 Claims

Specification

Subscription Required

Use Cases

Quick Links

Others