Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic projection apparatus, comprising:
- a projection system configured to project a patterned radiation beam onto a target portion of a substrate;
a positioning structure configured to move the substrate relative to the projection system during exposure by the patterned radiation beam;
a pivotable mirror configured to move the patterned radiation beam relative to the projection system during at least one pulse of the patterned radiation beam; and
an actuator configured to oscillatingly pivot the mirror according to an oscillation timing that substantially corresponds to a pulse frequency of a radiation system and such that the patterned radiation beam is scanned in substantial synchronism with the movement of the substrate during the at least one pulse.
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Abstract
Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.
91 Citations
48 Claims
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1. A lithographic projection apparatus, comprising:
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a projection system configured to project a patterned radiation beam onto a target portion of a substrate;
a positioning structure configured to move the substrate relative to the projection system during exposure by the patterned radiation beam;
a pivotable mirror configured to move the patterned radiation beam relative to the projection system during at least one pulse of the patterned radiation beam; and
an actuator configured to oscillatingly pivot the mirror according to an oscillation timing that substantially corresponds to a pulse frequency of a radiation system and such that the patterned radiation beam is scanned in substantial synchronism with the movement of the substrate during the at least one pulse. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31)
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32. A device manufacturing method, comprising:
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moving a substrate relative to a projection system that projects a patterned radiation beam onto a substrate during exposure;
oscillatingly pivoting a pivotable mirror according to an oscillation timing that substantially corresponds to a pulse frequency of the patterned radiation beam so as to alter a path of the patterned radiation beam in substantial synchronism with movement of the substrate; and
projecting the patterned radiation beam onto the substrate. - View Dependent Claims (33, 34, 35, 36, 37, 38, 39)
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40. An apparatus comprising a projection system, the projection system having:
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a pivotable mirror configured to receive a patterned beam of radiation; and
an actuator functionally connected to the pivotable mirror and configured to oscillatingly pivot the mirror. - View Dependent Claims (41, 42, 43, 44)
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45. A lithographic apparatus comprising:
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an illumination system configured to condition a radiation beam;
a support constructed to hold a patterning device, the patterning device configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
a substrate table constructed to hold a substrate;
a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
a position measurement system configured to measure a position of the patterning device, or of the support, or of both the patterning device and the support;
a position measurement system configured to measure a position of the substrate, or of the substrate table, or of both the substrate and the substrate table; and
a radiation beam position adjuster configured to adjust a position of the patterned beam of radiation projected onto the substrate, relative to the position of the projection system, in response to a deviation of the measured relative position of the patterning device and the substrate from an intended relative position of the patterning device and the substrate. - View Dependent Claims (46)
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47. A device manufacturing method, comprising:
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patterning a beam of radiation with a patterning device;
projecting the patterned beam of radiation, using a projection system, onto a target portion of a substrate to form an exposure;
measuring the position of the patterning device, of a support holding the patterning device, or of both the patterning device and the support, during the exposure;
measuring the position of the substrate, of a table holding the substrate, or of both the substrate and the table, during the exposure; and
adjusting a position of the patterned beam of radiation projected onto the substrate, relative to the projection system, in response to a deviation of the measured relative position of the patterning device and the substrate from an intended relative position of the patterning device and the substrate. - View Dependent Claims (48)
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Specification