Plasma processing apparatus and plasma processing method
First Claim
1. A plasma processing apparatus, comprising:
- a dielectric member that allows a microwave propagated through a waveguide and passed through a slot to be transmitted;
a plurality of first gas injection members a first injection holes and disposed at predetermined positions at a frame supporting the dielectric members;
a plurality of second gas injection members having a second injection holes located lower than the first injection holes and disposed at predetermined positions at the frame so as not to block a flow of plasma onto a workpiece;
a first gas supply means that injects a first processing gas to a desired position through the first injection holes at the first gas injection members;
a second gas supply means that injects a second processing gas through the second injection holes at the second gas injection members to a position lower than the position at which the first processing gas is injected; and
a processing chamber where the workpiece is processed with plasma generated by raising the first processing gas and the second processing gas to plasma with microwaves.
1 Assignment
0 Petitions
Accused Products
Abstract
At a frame 26 in a microwave plasma processing apparatus 100, numerous horizontal spray gas nozzles 27 formed therein injection holes A and numerous vertical gas nozzles 28 formed therein injection holes B are fixed. A first gas supply means 50 injects argon gas through the injection holes A into an area near each dielectric parts 31a. A second gas supply means 55 injects silane gas and hydrogen gas through the injection holes B into a position at which the gases do not become over-dissociated. The gases injected as described above are raised to plasma with a microwave transmitted through each dielectric parts 31a. Since the vertical gas nozzles 28 are mounted at positions at which they do not block the flow of plasma traveling toward a substrate G, ions and electrons do not collide with the vertical gas nozzles 28 readily.
263 Citations
18 Claims
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1. A plasma processing apparatus, comprising:
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a dielectric member that allows a microwave propagated through a waveguide and passed through a slot to be transmitted; a plurality of first gas injection members a first injection holes and disposed at predetermined positions at a frame supporting the dielectric members; a plurality of second gas injection members having a second injection holes located lower than the first injection holes and disposed at predetermined positions at the frame so as not to block a flow of plasma onto a workpiece; a first gas supply means that injects a first processing gas to a desired position through the first injection holes at the first gas injection members; a second gas supply means that injects a second processing gas through the second injection holes at the second gas injection members to a position lower than the position at which the first processing gas is injected; and a processing chamber where the workpiece is processed with plasma generated by raising the first processing gas and the second processing gas to plasma with microwaves. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A plasma processing method comprising steps for:
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transmitting through a dielectric member a microwave propagated through a waveguide and passed through a slot; injecting a first processing gas to a desired position within a processing chamber through first injection holes at a plurality of first gas injection members mounted at predetermined positions at a frame supporting the dielectric member; injecting a second processing gas through second injection holes at a plurality of second gas injection members disposed at predetermined positions at the frame so as not to block the flow of plasma toward a workpiece, with the second injection holes set lower than the first injection holes, to a position lower than the position at which the first processing gas is injected; and raising to plasma the first processing gas injected and the second processing gas injected with microwaves and processing the workpiece with the plasma. - View Dependent Claims (18)
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Specification