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Lithographic apparatus having a controlled motor, and motor control system and method

  • US 20070164697A1
  • Filed: 01/13/2006
  • Published: 07/19/2007
  • Est. Priority Date: 01/13/2006
  • Status: Active Grant
First Claim
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1. A lithographic apparatus, comprising:

  • an illumination system configured to condition a radiation beam;

    a patterning support constructed to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;

    a substrate support constructed to hold a substrate;

    a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and

    a positioning system to position the patterning support, the substrate support, or both, the positioning system comprising a motor with a stator and a mover that is coupled to one of the patterning support and the substrate support, and an associated motor control system having a controller configured to provide an output to control a current applied to the motor, wherein the motor control system is configured to;

    (a) determine a controller output that is adapted to compensate for a weight of the mover and associated support;

    (b) determine a deviation of the output obtained under (a) from an output that is adapted to compensate a gravity force acting on the mover and associated support; and

    (c) correct the current applied to the motor based on the deviation obtained under (b).

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