Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic apparatus, comprising:
- an illumination system that produces a beam of radiation;
an array of individually controllable elements that patterns the beam; and
a projection system that projects the patterned beam onto a target portion of a substrate, wherein each element in the array of individually controllable elements comprises a stack of top, middle, and bottom dielectric layers, at least the middle dielectric layer comprising a solid state electro-optical material, whereby on application of a control signal the element is selectively changed between a first state and a second state, such that proportions of the radiation that are transmitted and reflected, respectively, at a boundary between the middle dielectric layer and at least one of the top or bottom dielectric layers are different in the first and second states.
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Abstract
An array of individually controllable elements is comprised of elements, each formed of a stack of layers of dielectric material. At least one layer is an electro-optical material. The at least one layer'"'"'s refractive index for radiation that is plane polarized in a given direction can be changed by application of a voltage in order to change the reflection/transmission characteristic of the boundary between this layer and the adjacent layer.
35 Citations
18 Claims
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1. A lithographic apparatus, comprising:
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an illumination system that produces a beam of radiation;
an array of individually controllable elements that patterns the beam; and
a projection system that projects the patterned beam onto a target portion of a substrate, wherein each element in the array of individually controllable elements comprises a stack of top, middle, and bottom dielectric layers, at least the middle dielectric layer comprising a solid state electro-optical material, whereby on application of a control signal the element is selectively changed between a first state and a second state, such that proportions of the radiation that are transmitted and reflected, respectively, at a boundary between the middle dielectric layer and at least one of the top or bottom dielectric layers are different in the first and second states. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. An array of individually controllable elements that pattern a beam of radiation, wherein each element in the array of individually controllable elements comprises:
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top, middle, and bottom dielectric layers, at least the middle dielectric layer being formed of a solid state electro-optical material, wherein on application of a control signal the element is selectively changed between a first state and a second state, such that proportions of the radiation that are transmitted and reflected, respectively, at a boundary between the middle dielectric layer and at least one of the top or bottom dielectric layers are different in the first and second states. - View Dependent Claims (15)
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16. A device manufacturing method, comprising:
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forming each element in an array of individually controllable elements from top, middle, and bottom dielectric layers;
forming at least the middle dielectric layer from a solid state electro-optical material;
patterning a beam of radiation from an illumination source using the array of individually controllable elements; and
projecting the patterned beam onto a target portion of a substrate. - View Dependent Claims (17, 18)
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Specification