Please download the dossier by clicking on the dossier button x
×

Semiconductor device manufacturing method, mask manufacturing method, and exposure method

  • US 20070166627A1
  • Filed: 04/26/2006
  • Published: 07/19/2007
  • Est. Priority Date: 01/16/2006
  • Status: Active Grant
First Claim
Patent Images

1. A method for manufacturing a semiconductor device, comprising:

  • forming a transfer pattern including a line whose width or angle varies, by performing multiple exposure using a plurality of masks having different patterns over different mask substrates.

View all claims
  • 4 Assignments
Timeline View
Assignment View
    ×
    ×