LIGHT EMITTING DIODES (LEDs) WITH IMPROVED LIGHT EXTRACTION BY ROUGHENING
First Claim
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1. A method comprising:
- providing a light-emitting diode (LED) wafer assembly, comprising;
a conductive substrate;
a p-doped layer disposed above the conductive substrate;
an active layer disposed above the p-doped layer;
an n-doped layer disposed above the active layer;
applying a mask to a surface of the n-doped layer;
etching the surface of the n-doped layer such that etched pits are formed in the surface;
removing the mask; and
roughening or texturing the surface of the n-doped layer including the etched pits.
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Abstract
Systems and methods are disclosed for fabricating a semiconductor light-emitting diode (LED) device by forming an n-doped gallium nitride (n-GaN) layer on the LED device and roughening the surface of the n-GaN layer to extract light from an interior of the LED device.
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Citations
22 Claims
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1. A method comprising:
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providing a light-emitting diode (LED) wafer assembly, comprising;
a conductive substrate;
a p-doped layer disposed above the conductive substrate;
an active layer disposed above the p-doped layer;
an n-doped layer disposed above the active layer;
applying a mask to a surface of the n-doped layer;
etching the surface of the n-doped layer such that etched pits are formed in the surface;
removing the mask; and
roughening or texturing the surface of the n-doped layer including the etched pits. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method comprising:
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providing a light-emitting diode (LED) wafer assembly, comprising;
a conductive substrate;
a p-doped layer disposed above the conductive substrate;
an active layer disposed above the p-doped layer;
an n-doped layer disposed above the active layer;
applying a mask to a surface of the n-doped layer;
etching the surface of the n-doped layer such that etched pits are formed in the surface;
removing the mask; and
immersing the surface of the n-doped layer including the etched pits in an electrolytic solution;
applying an electrical bias to the conductive substrate; and
illuminating the surface such that photoelectrochemical (PEC) oxidation and etching occurs to roughen the surface of the n-doped layer including surfaces of the etched pits. - View Dependent Claims (13, 14, 15, 16, 17, 18)
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19. A method comprising:
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applying a mask to a surface of a light-emitting diode (LED) wafer;
etching the surface of the LED wafer such that etched pits are formed in the surface;
removing the mask; and
roughening or texturing the surface of the LED wafer including the etched pits. - View Dependent Claims (20, 21, 22)
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Specification