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RF plasma-enhanced deposition of fluorinated films

  • US 20070172666A1
  • Filed: 01/24/2006
  • Published: 07/26/2007
  • Est. Priority Date: 01/24/2006
  • Status: Abandoned Application
First Claim
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1. A method for forming a fluorinated film on a surface, the method comprising:

  • (a) depositing a fluorinated film comprising active sites on the surface by exposing the surface to an RF plasma comprising fluorine-containing molecular fragments generated from fluorinated precursor molecules; and

    (b) quenching the active sites by exposing the fluorinated film to a gas comprising fluorinated quenching molecules in situ, in the absence of plasma.

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