RF plasma-enhanced deposition of fluorinated films
First Claim
1. A method for forming a fluorinated film on a surface, the method comprising:
- (a) depositing a fluorinated film comprising active sites on the surface by exposing the surface to an RF plasma comprising fluorine-containing molecular fragments generated from fluorinated precursor molecules; and
(b) quenching the active sites by exposing the fluorinated film to a gas comprising fluorinated quenching molecules in situ, in the absence of plasma.
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Abstract
Low- or atmospheric pressure RF plasma-enhanced thin film deposition methods are provided for the deposition of hydrophobic fluorinated thin films onto various substrates. The methods include at least two steps. In the first step, RF plasma-mediated deposition is used to deposit a fluorinated film onto a substrate surface. In a second step, plasma-generated active sites on the fluorinated film are quenched by reacting them with stable fluorinated gas-phase molecules in situ, in the absence of plasma, to provide a hydrophobic fluorinated thin film having a very low oxygen content. In some instances the hydrophobic fluorinated thin films have an atomic oxygen concentration of no more than about 3%.
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Citations
27 Claims
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1. A method for forming a fluorinated film on a surface, the method comprising:
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(a) depositing a fluorinated film comprising active sites on the surface by exposing the surface to an RF plasma comprising fluorine-containing molecular fragments generated from fluorinated precursor molecules; and
(b) quenching the active sites by exposing the fluorinated film to a gas comprising fluorinated quenching molecules in situ, in the absence of plasma. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A coated substrate comprising:
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(a) a substrate having a surface; and
(b) a crosslinked fluorinated film bonded the surface of the substrate;
wherein the fluorinated film has a fluorine content of at least about 50 atomic percent, an oxygen content of no more than about 3 atomic percent and a C/F ratio of about 0.7 to about 1. - View Dependent Claims (16, 17, 18, 19)
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20. A coated substrate comprising:
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(a) an inorganic substrate having a surface; and
(b) a crosslinked fluorinated film bonded to the surface of the substrate;
wherein the fluorinated film has a fluorine content of at least about 50 atomic percent and an oxygen content of no more than about 3 atomic percent. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27)
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Specification