Resistance-stabilizing additives for electrolyte

• US 20070178378A1
• Filed: 01/31/2006
• Published: 08/02/2007
• Est. Priority Date: 01/31/2006
• Status: Active Grant

• Current Assignee: Medtronic Incorporated (Medtronic Plc)
• Original Assignee: Medtronic Incorporated (Medtronic Plc)
• Inventors: Schmidt, Craig, Merritt, Donald
• Granted Patent: US 7,807,300 B2
• Time in Patent Office: Days
• US Class Current: 429/188
• CPC Class Codes: H01M 10/0567 characterised by the additives
• CPC Class Codes: Y02E 60/10 Energy storage using batteries

Abstract

A resistance-stabilizing additive to an electrolyte for a battery cell in an implantable medical device is presented. At least one resistance-stabilizing additive is selected from a group comprising an electron withdrawing group, an aromatic diacid salt, an inorganic salt, an aliphatic organic acid, an aromatic diacid, and an aromatic monoacid.

Claims

1. A resistance-stabilizing additive for an electrolyte of a battery cell in an implantable medical device (IMD) comprising:

at least one chemical compound selected from a chemical class consisting of an electron withdrawing group, an aromatic diacid salt, an inorganic salt, an aliphatic organic acid, an aromatic diacid, and an aromatic monoacid.

2. The additive of claim 1 wherein the electron-withdrawing group selected from one of trifluoromethylvinyl acetate and 2,2,2-trifluoroacetamide.

3. The additive of claim 1, wherein aromatic monoacid comprises benzoic acid.

4. The additive of claim 1, wherein the benzoic acid includes fluorinated benzoic acid.

5. The additive of claim 1, wherein the benzoic acid being one of 3-hydroxy benzoic acid and 2-4 hydroxy benzoic acid.

6. The additive of claim 1, wherein the organic acid selected from a group comprising carboxylic acid, benzoic acid, and hexafluoroglutaric acid.

8. The additive of claim 6 wherein the electron-withdrawing group selected from one of trifluoromethylvinyl acetate and 2,2,2-trifluoroacetamide.

7. An additive to an electrolyte for use in a battery cell in an IMD, the additive comprising:

an electron-withdrawing group.

9. An additive to an electrolyte for use in a battery cell in an IMD, the additive being at least one of tetramethyl ammonium (TMA) hydrogen phthalate, tetrabutyl-ammonium (TBA) hydrogen sulfate, phosphonoacetic acid, 2,2,2-trifluoroacetamide, trifluoromethyl vinyl acetate, phthalic acid, benzoylacetone, benzoltrifluoroactone, and benzoic acid.

10. An additive composition for an electrolyte in a battery cell for an IMD comprising:

a first resistance-stabilizing additive; and

a second resistance-stabilizing additive combined with the first resistance-stabilizing additive.

11. The additive composition of claim 10, the first resistance-stabilizing additive being at least one of TMA hydrogen phthalate, TBA hydrogen sulfate, phosphonoacetic acid, 2,2,2-trifluoroacetamide, trifluoromethyl vinyl acetate, phthalic acid, benzoylacetone, benzoltrifluoroactone, and benzoic acid.

12. The additive composition of claim 10, the second resistance-stabilizing additive being at least one of TMA hydrogen phthalate, TBA hydrogen sulfate, phosphonoacetic acid, 2,2,2-trifluoroacetamide, trifluoromethyl vinyl acetate, phthalic acid, benzoylacetone, benzoltrifluoroactone, and benzoic acid.

13. The additive composition of claim 10, further comprising:

a third resistance-stabilizing additive, the third resistance-stabilizing additive being at least one of TMA hydrogen phthalate, TBA hydrogen sulfate, phosphonoacetic acid, 2,2,2-trifluoroacetamide, trifluoromethyl vinyl acetate, phthalic acid, benzoylacetone, benzoltrifluoroactone, and benzoic acid.

14. A method for forming an additive composition for an electrolyte in a battery cell for an IMD, the method comprising:

selecting a first resistance-stabilizing additive; and

combining a second resistance-stabilizing additive with the first resistance-stabilizing additive to form a resistance-stabilizing composition.

15. The method of claim 14, further comprising:

combining the resistance-stabilizing composition with a base electrolyte composition for the battery cell.

16. The method of claim 14, the first resistance-stabilizing additive being at least one of TMA hydrogen phthalate, TBA hydrogen sulfate, phosphonoacetic acid, 2,2,2-trifluoroacetamide, trifluoromethyl vinyl acetate, phthalic acid, benzoylacetone, benzoltrifluoroactone, and benzoic acid.

17. The method of claim 14, the second resistance-stabilizing additive being at least one of TMA hydrogen phthalate, TBA hydrogen sulfate, phosphonoacetic acid, 2,2,2-trifluoroacetamide, trifluoromethyl vinyl acetate, phthalic acid, benzoylacetone, benzoltrifluoroactone, and benzoic acid.