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PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

  • US 20070181531A1
  • Filed: 02/06/2007
  • Published: 08/09/2007
  • Est. Priority Date: 02/06/2006
  • Status: Abandoned Application
First Claim
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1. A plasma processing apparatus in which plasma is generated with a predetermined gas excited by a microwave and a subject to be processed is processed by the generated plasma, the plasma processing apparatus comprising:

  • a processing chamber in which the subject to be processed is processed with plasma;

    a gas supply unit that supplies the predetermined gas into the processing chamber; and

    a microwave supply unit that supplies the microwave into the processing chamber via slots provided in an antenna and via a dielectric member through which the microwave is transmitted;

    wherein;

    the dielectric member has at least partially a porous member and the predetermined gas is introduced into the processing chamber through the porous member.

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