Hydrogel-supported porous semiconductor devices

• US 20070184222A1
• Filed: 04/20/2005
• Published: 08/09/2007
• Est. Priority Date: 04/20/2004
• Status: Abandoned Application

• Current Assignee: University of Rochester
• Original Assignee: University of Rochester
• Inventors: Miller, Benjamin, Delouise, Lisa
• Application Number:
  US11/578,930
• Publication Number:
  US 20070184222A1
• Time in Patent Office: Days
• US Class Current: 428/35.200
• CPC Class Codes: A61B 5/0059 using light, e.g. diagnosis by transillumination, diascopy, fluorescence A61B5/0093, A61B5/1455, A61B5/02416 and A61B5/0261 take precedence
• CPC Class Codes: A61B 5/412 Detecting or monitoring sepsis
• CPC Class Codes: A61B 5/445 Evaluating skin irritation or skin trauma, e.g. rash, eczema, wound, bed sore
• CPC Class Codes: A61F 13/00 Bandages or dressings radioactive dressings A61N5/1029; Absorbent pads
• CPC Class Codes: A61K 49/0073 semi-solid, gel, hydrogel, ointment
• CPC Class Codes: G01N 33/54373 involving physiochemical end-point determination, e.g. wave-guides, FETS, gratings
• CPC Class Codes: Y10T 428/1334 Nonself-supporting tubular film or bag [e.g., pouch, envelope, packet, etc.]

Abstract

A product including a hydrogel matrix and a porous semiconductor material at least partially embedded within the hydrogel matrix. Also disclosed are methods of making the product and a substantially flexible porous semiconductor material, as well as methods of using the product to deliver a therapeutic agent to a subject and detecting the presence of a pathogen and/or infection at a wound site.

Claims

1. A product comprising:

a hydrogel matrix and

a porous semiconductor material at least partially embedded within the hydrogel matrix.

2. The product according to claim 1 wherein the hydrogel matrix is selected from the group of synthetic hydrogels, natural hydrogels, and mixtures thereof.

3. The product according to claim 2 wherein the hydrogel matrix is selected from the group of polyacrylamide hydrogels, polyvinyl hydrogels, polylactic acid hydrogels, polyglycolic acid hydrogels, polyethylene glycol hydrogels, agarose hydrogels, collagen hydrogels, acrylic hydrogels, acrylated quaternary ammonium monomeric hydrogels, polyurethane hydrogels, organic/inorganic hybrid hydrogels, cross-linked keratin hydrogels, and combinations thereof.

4. The product according to claim 1 wherein the hydrogel matrix comprises one or more agents selected from the group of antimicrobial agents, bacteriostatic agents, antiviral agents, and antifungal agents.

5. The product according to claim 1, wherein the porous semiconductor material comprises p-doped silicon, n-doped silicon, intrinsic or undoped silicon, a silicon alloy, a material based on Group III element nitrides, a material based on Group III.V materials, or combinations thereof.

6. The product according to claim 1, wherein the porous semiconductor material is substantially flexible.

7. The product according to claim 1 wherein the porous semiconductor material comprises:

a central layer interposed between upper and lower layers, each of the upper and lower layers including strata of alternating porosity; and

one or more probes coupled to the porous semiconductor material, the one or more probes being able to bind to a target molecule, whereby a detectable change occurs in a refractive index of the porous semiconductor material upon binding of the one or more probes to the target molecule.

8. The product according to claim 7, wherein the one or more probes are selected from the group of non-polymeric small molecules, polypeptides or proteins, antibodies, and oligonucleotides.

9. The product according to claim 7 wherein the one or more probes are the same.

10. The product according to claim 7 wherein each of the one or more probes is specific for one or more pathogens or one or more host markers of infection.

11. The product according to claim 7 wherein the porous semiconductor material comprises one or more therapeutic agents retained within one or more pores of the semiconductor material.

12. The product according to claim 1 wherein the porous semiconductor material comprises one or more therapeutic agents retained within one or more pores of the semiconductor material.

13. The product according to claim 12 wherein the one or more therapeutic agents is selected from the group of growth factors, keratins, cytokines, antibiotic agents, antimicrobial agents, antifungal agents, antiviral agents, and tumor suppressor agents.

14. The product according to claim 13 wherein the growth factors comprise basic fibroblast growth factor (bFGF), acidic fibroblast growth factor (aFGF), vascular endothelial cell growth factor (VEGF), platelet derived growth factor (PDGF), insulin-like growth factors (IGF-I and IGF-II), nerve growth factor (NGF), epidermal growth factor (EGF), heparin-binding EGF-like growth factor (HBEGF), transforming growth factor (TGF), or combinations thereof.

15. The product according to claim 13 wherein the keratins comprise type K1, type K5, type K10, type K14, or combinations thereof.

16. The product according to claim 13 wherein the cytokines comprise IL-1β

, IL-1RA, TNF-α

, IL-12, INF-γ

, or combinations thereof.

17. The product according to claim 1 wherein the porous semiconductor material is fully embedded within the hydrogel matrix.

18. The product according to claim 1 further comprising

a vapor barrier applied to at least one side of the hydrogel matrix.

19. The product according to claim 1 further comprising:

a release layer contacting at least one side of the product.

20. A sterile package containing a sterile product according to claim 1.

26. A method of making the product of claim 1 comprising:

providing a porous semiconductor material; and

at least partially embedding the porous semiconductor material in a hydrogel matrix.

27. The method according to claim 26 wherein said at least partially embedding comprises fully embedding the porous semiconductor material in a hydrogel matrix.

28. The method according to claim 26 wherein said at least partially embedding comprises:

providing a hydrogel matrix, and

laminating the porous semiconductor material onto the hydrogel matrix under conditions effective to at least partially embed the porous semiconductor material in the hydrogel matrix.

29. The method according to claim 26 wherein said at least partially embedding comprises:

providing an activated monomer solution,

pouring the activated monomer solution over the porous semiconductor material, and

subjecting the activated monomer solution to one or more cross-linking steps under conditions effective to produce a hydrogel matrix, whereby the porous semiconductor material is at least partially embedded in the hydrogel matrix.

30. The method according to claim 26, further comprising:

coupling one or more probes to the porous semiconductor material prior to said at least partially embedding.

31. The method according to claim 26, further comprising:

loading one or more therapeutic agents into one or more pores of the semiconductor material prior to said at least partially embedding.

32. A method of detecting a pathogen and/or infection at a wound site, said method comprising:

providing a product of claim 10;

applying the product to a wound site; and

observing a detectable change in a refractive index of the porous semiconductor material, wherein a detectable change in the refractive index indicates presence of a pathogen and/or infection at the wound site.

33. A method of delivering one or more therapeutic agents to a subject, said method comprising providing a product according to claim 12 and applying the product to a tissue of the subject whereby the one or more therapeutic agents is delivered to the subject.

21. A method of making a substantially flexible porous semiconductor material comprising:

introducing a semiconductor substrate into an electrochemical etching bath;

applying a current density for a sufficient duration to achieve a porous region of the semiconductor substrate; and

second applying a sufficiently high current density to cause electropolishing of an interface between the porous region and a remainder of the semiconductor substrate, wherein said second applying releases the porous region from the remainder of the semiconductor substrate.

22. The method according to claim 21 further comprising creating one or more hydrophilic pore channels in the porous semiconductor material.

23. The method according to claim 22 wherein said creating one or more hydrophilic pore channels comprises one or more thermal oxidation steps.

24. The method according to claim 22 wherein said creating one or more hydrophilic pore channels comprises immersing the porous semiconductor material in a solution comprising ethanol and hydrogen peroxide.

25. The method according to claim 21 further comprising lowering the surface tension of the porous semiconductor material.