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System, Masks, and Methods for Photomasks Optimized with Approximate and Accurate Merit Functions

  • US 20070186206A1
  • Filed: 10/06/2006
  • Published: 08/09/2007
  • Est. Priority Date: 10/06/2005
  • Status: Active Grant
First Claim
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1. A method, comprising:

  • evaluating a first merit function for a first pattern;

    evaluating a second merit function for the first pattern;

    determining adjustment parameters between the first merit function and the second merit function for the first pattern;

    iteratively modifying the first pattern based, at least in part, on the second merit function and the adjustment parameters for the first pattern.

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