EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

• US 20070188730A1
• Filed: 02/15/2007
• Published: 08/16/2007
• Est. Priority Date: 02/15/2006
• Status: Active Grant

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Ohsaki, Yumiko, Yamazoe, Kenji, Takeuchi, Seiji, Yoshii, Minoru
• Granted Patent: US 7,508,493 B2
• Time in Patent Office: Days
• US Class Current: 355/71
• CPC Class Codes: G03F 7/70108 Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
• CPC Class Codes: G03F 7/70566 Polarisation control

Abstract

An exposure apparatus includes an illumination optical system configured to illuminate a reticle, a projection optical system configured to project a pattern of the reticle onto a substrate, a polarization adjuster configured to independently adjust each polarization state of plural areas in an effective light source distribution used to illuminate the reticle, a polarization measurement unit configured to measure a polarization state of light that has passed the polarization adjuster, and a controller configured to independently control each polarization state of the plural areas via the polarization adjuster based on a measurement result of the polarization measurement unit.

Claims

1. An exposure apparatus comprising:

an illumination optical system configured to illuminate a reticle;

a projection optical system configured to project a pattern of the reticle onto a substrate;

a polarization adjuster configured to independently adjust each polarization state of plural areas in an effective light source distribution used to illuminate the reticle;

a polarization measurement unit configured to measure a polarization state of light that has passed the polarization adjuster; and

a controller configured to independently control each polarization state of the plural areas via the polarization adjuster based on a measurement result of the polarization measurement unit.

2. An exposure apparatus according to claim 1, wherein the polarization adjuster includes at least two waveplates.

3. An exposure apparatus according to claim 2, wherein the at least two waveplates are arranged on a plane perpendicular to an optical axis of the illumination optical system.

4. An exposure apparatus according to claim 2, wherein the at least two waveplates stack in an optical axis direction of the illumination optical system.

5. An exposure apparatus according to claim 1, wherein the polarization adjuster is arranged at a pupil position in the illumination optical system.

6. An exposure apparatus according to claim 1, wherein the polarization adjuster is arranged at a pupil position in the projection optical system.

7. An exposure apparatus according to claim 2, wherein the controller independently controls a rotation of each of the at least two waveplates based on the measurement result of the polarization measurement unit.

8. An exposure apparatus according to claim 1, wherein the polarization measurement unit measures a polarization state of the light that has passed at least part of the illumination optical system.

9. An exposure apparatus according to claim 1, wherein the polarization measurement unit measures a polarization state of the light that has passed at least part of the projection optical system.

10. A device manufacturing method comprising the steps of:

exposing a substrate using an exposure apparatus; and

developing the substrate that has been exposed,

wherein the exposure apparatus includes an illumination optical system configured to illuminate a reticle, a projection optical system configured to project a pattern of the reticle onto a substrate, a polarization adjuster configured to independently adjust each polarization state of plural areas in an effective light source distribution used to illuminate the reticle, a polarization measurement unit configured to measure a polarization state of light that has passed the polarization adjuster, and a controller configured to independently control each polarization state of the plural areas via the polarization adjuster based on a measurement result of the polarization measurement unit.