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EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

  • US 20070188730A1
  • Filed: 02/15/2007
  • Published: 08/16/2007
  • Est. Priority Date: 02/15/2006
  • Status: Active Grant
First Claim
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1. An exposure apparatus comprising:

  • an illumination optical system configured to illuminate a reticle;

    a projection optical system configured to project a pattern of the reticle onto a substrate;

    a polarization adjuster configured to independently adjust each polarization state of plural areas in an effective light source distribution used to illuminate the reticle;

    a polarization measurement unit configured to measure a polarization state of light that has passed the polarization adjuster; and

    a controller configured to independently control each polarization state of the plural areas via the polarization adjuster based on a measurement result of the polarization measurement unit.

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