Device and method for generating excited and/or ionized particles in a plasma
First Claim
1. A device for generating excited and/or ionized particles in a plasma from a process gas, comprising:
- a generator for generating an electromagnetic wave;
a waveguide;
a gas discharge chamber with a gas discharge space in which the excited and/or ionized particles are formed; and
a dielectric in which the gas discharge space is formed, the gas discharge chamber being arranged inside the waveguide, wherein the dielectric forms an end base from which side walls extend so as to form the gas discharge space, and wherein the electromagnetic wave can be coupled into the end base.
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Accused Products
Abstract
The invention relates to a device for generating excited and/or ionized particles in a plasma from a process gas, which comprises a generator for generating an electromagnetic wave, a waveguide, and a gas discharge chamber with a gas discharge space in which the excited and/or ionized particles are formed, and comprising a dielectric in which the gas discharge space is formed, the gas discharge chamber being arranged inside the waveguide. In order to be able to use the largest possible microwave powers while achieving a long service life, the dielectric forms an end base from which side walls branch off so as to form the gas discharge space. The electromagnetic wave can also be coupled into the end base.
5 Citations
28 Claims
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1. A device for generating excited and/or ionized particles in a plasma from a process gas, comprising:
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a generator for generating an electromagnetic wave;
a waveguide;
a gas discharge chamber with a gas discharge space in which the excited and/or ionized particles are formed; and
a dielectric in which the gas discharge space is formed, the gas discharge chamber being arranged inside the waveguide, wherein the dielectric forms an end base from which side walls extend so as to form the gas discharge space, and wherein the electromagnetic wave can be coupled into the end base. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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27. A method for generating excited and/or ionized particles in a plasma from a process gas in which an electromagnetic wave is generated and is coupled into a dielectric of a gas discharge chamber, comprising:
forming in the dielectric a gas discharge space which comprises a gas inlet and a gas outlet for supplying or removing process gas, with the gas discharge chamber being arranged inside a waveguide, wherein the electromagnetic wave is coupled into an end base of the dielectric, the gas discharge space is arranged between the end base and the gas outlet. - View Dependent Claims (28)
Specification