Apparatus for generating remote plasma
First Claim
1. An apparatus for generating a remote plasma, comprising:
- an RF (radio frequency) antenna disposed in regard to a chamber;
a plasma generating unit formed in an uppermost portion of the chamber, wherein a plurality of plasma generation gas introduction pipes are communicated with the plasma generating unit;
a first shower head disposed below the plasma generating unit, and including a plurality of first plasma guide holes;
a second shower head disposed below the first shower head, and including a plurality of source/purge gas guide holes and a plurality of second plasma guide holes directly connected to the respective first plasma guide holes; and
a source/purge gas introduction unit disposed between the first and second shower heads, wherein a plurality of source/purge gas introduction pipes are uniformly communicated with the source/purge gas introduction unit.
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Accused Products
Abstract
Provided is an apparatus for generating remote plasma. The apparatus includes an RF antenna disposed in regard to a chamber, a plasma generating unit formed in an uppermost portion of the chamber, wherein a plurality of plasma generation gas introduction pipes are communicated with the plasma generating unit, a first shower head disposed below the plasma generating unit, and having a plurality of first plasma guide holes, a second shower head disposed below the first shower head, and having a plurality of source/purge gas guide holes and a plurality of second plasma guide holes directly connected to the respective first plasma guide holes, and a source/purge gas introduction unit disposed between the first and second shower heads, wherein a plurality of source/purge gas introduction pipes are uniformly communicated with the source/purge gas introduction unit.
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Citations
8 Claims
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1. An apparatus for generating a remote plasma, comprising:
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an RF (radio frequency) antenna disposed in regard to a chamber; a plasma generating unit formed in an uppermost portion of the chamber, wherein a plurality of plasma generation gas introduction pipes are communicated with the plasma generating unit; a first shower head disposed below the plasma generating unit, and including a plurality of first plasma guide holes; a second shower head disposed below the first shower head, and including a plurality of source/purge gas guide holes and a plurality of second plasma guide holes directly connected to the respective first plasma guide holes; and a source/purge gas introduction unit disposed between the first and second shower heads, wherein a plurality of source/purge gas introduction pipes are uniformly communicated with the source/purge gas introduction unit. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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Specification