Apparatus for generating remote plasma

• US 20070193515A1
• Filed: 02/07/2007
• Published: 08/23/2007
• Est. Priority Date: 02/17/2006
• Status: Abandoned Application

• Current Assignee: Industry-University Cooperation Foundation Hanyang University
• Original Assignee: Industry-University Cooperation Foundation Hanyang University
• Inventors: Chung, Chin-Wook, Jeon, Hyeong-Tag, Kim, Seok-Hoon, Lee, Sahng-Kyoo, Kim, In-Hoe
• Application Number:
  US11/703,621
• Publication Number:
  US 20070193515A1
• Time in Patent Office: Days
• US Class Current: 118/723.0IR
• CPC Class Codes: H01J 37/3211 Antennas, e.g. particular shapes of coils
• CPC Class Codes: H01J 37/32357 Generation remote from the workpiece, e.g. down-stream
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H05H 1/46 using applied electromagnetic fields, e.g. high frequency or microwave energy H05H1/26 takes precedence

Abstract

Provided is an apparatus for generating remote plasma. The apparatus includes an RF antenna disposed in regard to a chamber, a plasma generating unit formed in an uppermost portion of the chamber, wherein a plurality of plasma generation gas introduction pipes are communicated with the plasma generating unit, a first shower head disposed below the plasma generating unit, and having a plurality of first plasma guide holes, a second shower head disposed below the first shower head, and having a plurality of source/purge gas guide holes and a plurality of second plasma guide holes directly connected to the respective first plasma guide holes, and a source/purge gas introduction unit disposed between the first and second shower heads, wherein a plurality of source/purge gas introduction pipes are uniformly communicated with the source/purge gas introduction unit.

Claims

1. An apparatus for generating a remote plasma, comprising:

an RF (radio frequency) antenna disposed in regard to a chamber;

a plasma generating unit formed in an uppermost portion of the chamber, wherein a plurality of plasma generation gas introduction pipes are communicated with the plasma generating unit;

a first shower head disposed below the plasma generating unit, and including a plurality of first plasma guide holes;

a second shower head disposed below the first shower head, and including a plurality of source/purge gas guide holes and a plurality of second plasma guide holes directly connected to the respective first plasma guide holes; and

a source/purge gas introduction unit disposed between the first and second shower heads, wherein a plurality of source/purge gas introduction pipes are uniformly communicated with the source/purge gas introduction unit.

2. The apparatus of claim 1, further comprising a DC bias generating unit disposed between the plasma generating unit and the first shower head.

3. The apparatus of claim 2, wherein the DC bias generating unit has the shape of a grid, and is formed of metallic material of which a surface is anodized.

4. The apparatus of claim 1, wherein an inlet and an outlet of each of the first plasma, second plasma and source/purge gas guide holes, and an outlet of each of the plasma generation gas and source/purge gas introduction pipes are tapered such that its diameter becomes greater as it gets closer to an end thereof.

5. The apparatus of claim 1, wherein the first plasma guide holes are radially arranged in the first shower head, and the second plasma guide holes and the source/purge gas guide holes are radially and alternately arranged in the second shower head.

6. The apparatus of claim 1, wherein the plurality of plasma generation gas introduction pipes are communicated with the plasma generating unit through an upper portion thereof or a side portion thereof.

7. The apparatus of claim 1, wherein a quartz is interposed between the RF antenna and the plasma generating unit.

8. The apparatus of claim 1, wherein the RF antenna comprises at least two loop-type antenna elements electrically connected in parallel and horizontally spaced apart from each other by a predetermined distance such that they are overlapped with each other, a power supply terminal being formed at one end and a ground terminal being formed at the other end of each of the antenna elements,

wherein the power supply terminal and the ground terminal of each of the antenna elements are symmetrically disposed with respect to a center of the antenna element, and a horizontally bent portion of one antenna element is disposed between the power terminal and the ground terminal of the other antenna element.