Photon sieve for optical systems in micro-lithography
First Claim
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1. A lithographic apparatus, comprising:
- an illumination system configured to condition a radiation beam; and
a patterning device configured to modulate the cross-section of the radiation beam, wherein a pupil-defining element in the illumination system comprises a photon sieve.
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Abstract
The use of photon sieves may be as a pupil defining element in an illumination system; a field of defining elements in an illumination system; a pupil lens element in a projection lens; a color correction system in the projection system; or as a transmitting diffractive element for EUV.
11 Citations
27 Claims
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1. A lithographic apparatus, comprising:
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an illumination system configured to condition a radiation beam; and
a patterning device configured to modulate the cross-section of the radiation beam, wherein a pupil-defining element in the illumination system comprises a photon sieve. - View Dependent Claims (6, 10, 11, 18, 22)
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2. A lithographic apparatus, comprising:
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an illumination system configured to condition a radiation beam;
a patterning device configured to modulate the cross-section of the radiation beam, wherein a field-defining element in the illumination system comprises a photon sieve. - View Dependent Claims (7, 12, 13, 19, 23)
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3. A lithographic apparatus, comprising:
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an illumination system configured to condition a radiation beam;
a patterning device configured to modulate the cross-section of the radiation beam; and
a projection system, comprising a pupil lens element, configured to project the modulated radiation beam onto a target portion of a substrate, wherein the pupil lens element in the projection system comprises a photon sieve. - View Dependent Claims (5, 8, 14, 15, 17, 20, 24)
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4. A lithographic apparatus, comprising:
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an illumination system configured to condition an EUV radiation beam;
a patterning device configured to modulate the cross-section of the EUV radiation beam; and
a projection system, comprising a pupil lens element, configured to project the modulated radiation beam onto a target portion of a substrate, wherein the illumination system or the projection system comprises mirror optics and a photon sieve. - View Dependent Claims (9, 16, 21, 25)
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26. A device manufacturing method comprising projecting a modulated beam of radiation onto a substrate, wherein the radiation is diffracted in an illumination system using a photon sieve.
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27. A device manufacturing method comprising projecting a modulated beam of radiation onto a substrate, wherein the radiation is patterned using a patterning device and focused in a projection system using a photon sieve.
Specification