DIRECT LIQUID INJECTOR DEVICE

• US 20070194470A1
• Filed: 02/19/2007
• Published: 08/23/2007
• Est. Priority Date: 02/17/2006
• Status: Abandoned Application

• Current Assignee: Aviza Technology Inc (Sumitomo Corporation)
• Original Assignee: Aviza Technology Inc (Sumitomo Corporation)
• Inventors: Dedontney, Jay Brian
• Application Number:
  US11/676,346
• Publication Number:
  US 20070194470A1
• Time in Patent Office: Days
• US Class Current: 261/76
• CPC Class Codes: B01F 23/12 with vaporisation of a liquid disinfection, sterilisation or deodorisation of air A61L9/00
• CPC Class Codes: B01F 25/105 Mixing heads, i.e. compact mixing units or modules, using mixing valves for feeding and mixing at least two components
• CPC Class Codes: C23C 16/4481 by evaporation using carrier gas in contact with the source material C23C16/4486 takes precedence

Abstract

A device for mixing, vaporizing and communicating a precursor element in a highly conductive fashion to a remote processing environment. A supply meter admits a precursor liquid according to a piezo controlled valve, which communicates therewith for controlling flow into a mixing manifold. A vaporizer manifold in cooperation with a carrier gas supply provides a carrier gas for contemporaneous delivery into the mixing manifold. A vaporizing component having at least a heating element in communication with the mixing manifold, in cooperation with a mixing (frit) material provided in the vaporizer body, causes a phase change of the liquid precursor into a vapor output. Delivery of the vapor outlet occurs along at least one high conductance run/vent valve located downstream from the vaporizing body, typically built into the vaporizer manifold architecture, and provides for metering of the vapor into a remote process chamber.

Claims

1. A direct liquid injector device comprising:

a carrier gas inlet;

a liquid metering valve delivering a liquid precursor into a volume of a carrier gas/liquid interface unit;

a vaporizer body receiving a mixture of the liquid precursor and a carrier gas;

a heating element in thermal contact with said vaporizer body;

a matrix material within said vaporizer body;

at least one high conductance run/vent valve located downstream from said vaporizing body for meter the mixture along a conduit for delivery into a remote process chamber.

2. The device of claim 1, wherein the volume is located above said vaporizer body.

3. The device of claim 1, wherein an annular gap allows the carrier gas to enter and sweep the liquid from the volume into said vaporizer body.

4. The device of claim 1 further comprising a carrier gas heater.

5. The device of claim 1 wherein said conduit is vertically displaced below said vaporizer body.

6. The device of claim 1 wherein said conduit is linear.

7. The device of claim 1 wherein said at least one high conductance run/vent valve further comprises at least one pair of valves.

8. The device of claim 1 wherein the carrier gas flows downward through the volume into said vaporizing body.

9. The device of claim 8 wherein said conduit extends orthogonal to a central axis of said vaporizing body.

10. The device of claim 8 wherein said conduit extends parallel to a central axis of said vaporizing body.

22. The device as described in claim 1, said vaporizer body further comprising at least one heated cavity arranged in communication with a crossover manifold and an embarkation manifold/control valve, each of said cavity and manifolds being sized and adapted for installation upon industry standard modular surface mount substrate components.

11. A device for mixing, vaporizing and communicating a precursor element in a highly conductive fashion to a remote processing environment, comprising:

a supply meter for admitting a precursor liquid according to an associated rate;

a control valve in communication with said supply meter for controlling said precursor liquid flow into a mixing manifold;

a vaporizer manifold in cooperation with a carrier gas supply and providing a carrier gas for contemporaneous delivery into said mixing manifold;

a vaporizing component including at least a heating element in communication with said mixing manifold and, in cooperation with a mixing material provided in said vaporizer body, causing a phase change of said liquid precursor into a vapor output; and

delivery of said vapor outlet along at least one high conductance run/vent valve located downstream from said vaporizing body for metering into a remote process chamber.

12. The device as described in claim 11, further comprising at least one base manifold in communication with said bubbler manifold for delivery of said vapor.

13. The device as described in claim 12, further comprising multiple base manifolds in communication with said bubbler manifold, at least one base manifold further comprising a diluted gas inlet line for further admixing said vapor.

14. The device as described in claim 11, further comprising a secondary heating element in communication with said carrier gas supply prior to delivery to said mixing manifold.

15. The device as described in claim 14, said heating elements each further comprising electrical coil resistance heaters associated with cavities through which at least one of said carrier gas and said pre-vaporous precursor/gas admixture passes.

16. The device as described in claim 11, further comprising a bubbler manifold provided in cooperation with said vaporizer manifold for use with lower vapor pressure precursors.

17. The device as described in claim 11, further comprising at least one pair of run/vent valves mounted to said vaporizer manifold in communicating with said downstream location from said vaporizing body.

18. The device as described in claim 11, said mixing manifold having a specified shape and size and further comprising an annular shaped pathway which communicates said liquid precursor with a likewise circular shaped and mating configuration associated with a crossover manifold, the annular shaping of a cooperating gap created therebetween permitting carrier gas to enter and sweep the liquid into said mixing material including a heated frit located below, and without touching surrounding walls associated with said vaporizing component.

19. The device as described in claim 18, further comprising said crossover manifold likewise incorporating a lengthwise path 66 extending to said annular shaped pathway communicating the carrier gas inlet.

20. The device as described in claim 11, further comprising dual liquid injection supply meters, control valves and vaporizer manifolds for admixing and vaporizing at least one specific liquid precursor.

21. The device as described in claim 20, further comprising a dual outlet, three base manifold exhibiting discrete outlets for two species of vapor created, with a common foreline connection.

23. The device as described in claim 11, further comprising said control valve utilizing a mechanical deformation of a piezo crystal in order to provide motion to said valve seat.

24. The device as described in claim 11, said control valve utilizing an electromagnetic force to provide motion to said valve seat.

25. The device as described in claim 11, said control valve utilizing a pneumatic actuation to provide motion to said valve seat.

26. The device as described in claim 11, said supply meter further comprising an analog electronic sensing and control design.

27. The device as described in claim 11, said supply meter further comprising a digital electronic sensing and control design

28. A device for mixing, vaporizing and communicating a precursor element in a highly conductive fashion to a remote processing environment, comprising:

a control valve in communication with said supply meter for controlling said precursor liquid flow into a mixing manifold;

a vaporizer manifold in cooperation with a carrier gas supply and providing a carrier gas for contemporaneous delivery into said mixing manifold;

a vaporizing component including at least a heating element in communication with said mixing manifold and, in cooperation with a mixing material provided in said vaporizer body, causing a phase change of said liquid precursor into a vapor output; and

delivery of said vapor outlet along at least one high conductance run/vent valve located downstream from said vaporizing body for metering into a remote process chamber.

29. The device as described in claim 28, further comprising said control valve utilizing a mechanical deformation of a piezo crystal to provide motion to the valve seat.

30. The device as described in claim 28, said control valve utilizing electromagnetic force to provide motion to said valve seat.

31. The device as described in claim 28, said control valve utilizing pneumatic actuation to provide motion to said valve seat.

32. The device as described in claim 28, said control valve further comprising a combination of analog and digital circuitry.