Display substrate, method of manufacturing the same and display device having the same

• US 20070195236A1
• Filed: 08/18/2006
• Published: 08/23/2007
• Est. Priority Date: 02/20/2006
• Status: Abandoned Application

• Current Assignee: Samsung Electronics Co. Ltd.
• Original Assignee: Samsung Electronics Co. Ltd.
• Inventors: Park, Jung-Woo, Kim, Seong-Ho, Kim, Jae-Hyun, Kim, Jong-Seong, Hong, Seong-Chul, Cho, Sung-Hwan, Seo, Bong-Sun, Yum, Ho-nam
• Application Number:
  US11/506,531
• Publication Number:
  US 20070195236A1
• Time in Patent Office: Days
• US Class Current: 349/114
• CPC Class Codes: G02F 1/133555 Transflectors
• CPC Class Codes: G02F 1/13439 characterised by their electrical, optical, physical properties; materials therefor; method of making

Abstract

A display substrate includes a transparent substrate, a pixel layer, an organic insulating layer, a transparent electrode and a reflective electrode. The pixel layer is formed on the transparent substrate, and includes a plurality of pixel parts. Each of the pixel parts includes a transmission region and a reflection region. The organic insulating layer is formed on the pixel layer. The transparent electrode is formed on the organic insulating layer corresponding to each of the pixel parts. The reflective electrode is formed on the transparent electrode corresponding to the reflection region. The reflective electrode includes a silver alloy that includes silver (Ag) and impurities having a low solubility in the silver.

Claims

1. A display substrate comprising:

a transparent substrate;

a pixel layer formed on the transparent substrate, the pixel layer having a plurality of pixel parts, each of the pixel parts including a transmission region and a reflection region;

an organic insulating layer formed on the pixel layer;

a transparent electrode formed on the organic insulating layer corresponding to each of the pixel parts; and

a reflective electrode formed on the transparent electrode corresponding to the reflection region, the reflective electrode including a silver alloy that includes silver (Ag) and impurities having a low solubility in silver.

2. The display substrate of claim 1, wherein the impurities comprise a metal.

3. The display substrate of claim 2, wherein the metal comprises a material selected from the group consisting of aluminum (Al), scandium (Sc), titanium (Ti), vanadium (V), chromium (Cr), manganese (Mn), iron (Fe), cobalt (Co), nickel (Ni), copper (Cu), zinc (Zn), gallium (Ga), yttrium (Y), zirconium (Zr), niobium (Nb), molybdenum (Mo), technetium (Tc), ruthenium (Ru), rhodium (Rh), palladium (Pd), cadmium (Cd), indium (In), tin (Sn), lanthanum (La), hafnium (Hf), tantalum (Ta), tungsten (W), rhenium (Re), osmium (Os), iridium (Ir), platinum (Pt), gold (Au), mercury (Hg), thallium (Tl), lead (Pb) and bismuth (Bi).

4. The display substrate of claim 3, wherein the metal comprises molybdenum, and an amount of the molybdenum in the silver alloy is about 1.1 wt % to about 1.5 wt %.

5. The display substrate of claim 1, wherein the impurities comprise a metal oxide.

6. The display substrate of claim 5, wherein the metal oxide comprises a material selected from the group consisting of lithium oxide (LiO₂, Li₂O, Li₂O₂), beryllium oxide (BeO), sodium oxide (NaO₂, Na₂O, Na₂O₂), magnesium oxide (MgO, MgO₂), aluminum oxide (Al₂O₃), calcium oxide (CaO, CaO₂), scandium oxide (Sc₂O₃), titanium oxide (TiO, TiO₂, Ti₂O₃, Ti₃O₅), vanadium oxide (VO, VO₂, V₂O₃, V₂O₅), chromium oxide (CrO₂, CrO₃, Cr₂O₃, Cr₃O₄), manganese oxide (MnO, MnO₂), iron oxide (FeO, Fe₂O₃, Fe₃O₄), cobalt oxide (CoO, Co₃O₄), nickel oxide (NiO, Ni₂O₃), copper oxide (CuO, Cu₂O), zinc oxide (ZnO), niobium oxide (NbO, NbO₂), molybdenum oxide (MoO, MoO₂, MoO₃), palladium oxide (PdO, PdO₂), cadmium oxide (CdO) and lead oxide (PbO, PbO₂)

7. The display substrate of claim 1, wherein the impurities comprise a nonmetal.

8. The display substrate of claim 7, wherein the nonmetal comprises a material selected from the group consisting of boron (B), carbon (C), silicon (Si), phosphorus (P) and sulfur (S).

9. The display substrate of claim 1, wherein the impurities comprise a mixture of a metal and a nonmetal.

10. The display substrate of claim 1, wherein a thickness of the reflective electrode is about 2,000 Å

to about 3,000 Å

.

11. The display substrate of claim 1, wherein a microlens is formed on the organic insulating layer.

12. A method of manufacturing a display substrate, comprising:

forming a pixel layer including a plurality of pixel parts on a transparent substrate, each of the pixel parts including a transmission region and a reflection region;

forming an organic insulating layer on the pixel layer;

forming a transparent electrode on the organic insulating layer corresponding to each of the pixel parts; and

forming a reflective electrode in the reflection region, the reflective electrode including a silver alloy that includes silver and impurities having a low solubility in silver.

13. The method of claim 12, wherein the impurities comprise a metal selected from the group consisting of aluminum (Al), scandium (Sc), titanium (Ti), vanadium (V), chromium (Cr), manganese (Mn), iron (Fe), cobalt (Co), nickel (Ni), copper (Cu), zinc (Zn), gallium (Ga), yttrium (Y), zirconium (Zr), niobium (Nb), molybdenum (Mo), technetium (Tc), ruthenium (Ru), rhodium (Rh), palladium (Pd), cadmium (Cd), indium (In), tin (Sn), lanthanum (La), hafnium (Hf), tantalum (Ta), tungsten (W), rhenium (Re), osmium (Os), iridium (Ir), platinum (Pt), gold (Au), mercury (Hg), thallium (Tl), lead (Pb) and bismuth (Bi).

14. The method of claim 13, wherein the metal comprises molybdenum, and an amount of the molybdenum in the silver alloy is about 1.1 wt % to about 1.5 wt %.

15. The method of claim 12, wherein the impurities comprise a metal oxide selected from the group consisting of lithium oxide (LiO₂, Li₂O, Li₂O₂), beryllium oxide (BeO), sodium oxide (NaO₂, Na₂O, Na₂O₂), magnesium oxide (MgO, MgO₂), aluminum oxide (Al₂O₃), calcium oxide (CaO, CaO₂), scandium oxide (Sc₂O₃), titanium oxide (TiO, TiO₂, Ti₂O₃, Ti₃O₅), vanadium oxide (VO, VO₂, V₂O₃, V₂O₅), chromium oxide (CrO₂, CrO₃, Cr₂O₃, Cr₃O₄), manganese oxide (MnO, MnO₂), iron oxide (FeO, Fe₂O₃, Fe₃O₄), cobalt oxide (CoO, Co₃0₄), nickel oxide (NiO, Ni₂O₃), copper oxide (CuO, Cu₂O), zinc oxide (ZnO), niobium oxide (NbO, NbO₂), molybdenum oxide (MoO, MoO₂, MoO₃), palladium oxide (PdO, PdO₂), cadmium oxide (CdO) and lead oxide (PbO, PbO₂).

16. The method of claim 12, wherein the impurities comprise a nonmetal selected from the group consisting of boron (B), carbon (C), silicon (Si), phosphorus (P) and sulfur (S).

17. A display device comprising:

a display substrate including;

a transparent substrate;

a pixel layer formed on the transparent substrate, the pixel layer having a plurality of pixel parts, each of the pixel parts including a transmission region and a reflection region;

an organic insulating layer formed on the pixel layer;

a transparent electrode formed on the organic insulating layer corresponding to each of the pixel parts; and

a reflective electrode formed on the transparent electrode corresponding to the reflection region, the reflective electrode including a silver alloy that includes silver and impurities having a low solubility in silver;

an opposite substrate; and

a liquid crystal layer interposed between the display substrate and the opposite substrate.

18. The display device of claim 17, wherein the impurities comprise molybdenum, and an amount of the molybdenum in the silver alloy is about 1.1 wt % to about 1.5 wt %.