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Exposure apparatus, exposure method, and method for producing device

  • US 20070195301A1
  • Filed: 04/19/2007
  • Published: 08/23/2007
  • Est. Priority Date: 06/10/2004
  • Status: Active Grant
First Claim
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1. A lithographic apparatus comprising:

  • an illuminator configured to condition a radiation beam;

    a support constructed to hold a patterning device, the patterning device configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam;

    a substrate table constructed to hold a substrate;

    a projection system configured to project the patterned radiation beam onto a target portion of the substrate;

    a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid within the space;

    an outlet configured to remove a mixture of liquid and gas passing through a gap between the liquid confinement structure and the substrate; and

    an evacuation system configured to draw the mixture through the outlet, the evacuation system comprising a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

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