Large field of view projection optical system with aberration correctability
First Claim
Patent Images
1. A system, comprising:
- a reticle;
a substrate; and
a reflective optical system configured to image the reticle onto the substrate, the reflective optical system comprising a primary mirror, the primary mirror including a first mirror and a second mirror, and a secondary mirror, wherein the reflective optical system has ten (10) degrees of freedom for both alignment and correction of aberrations when projecting an image of the reticle onto the substrate by reflections off the first mirror, the secondary mirror, and the second mirror.
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Abstract
An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage adapted to support a reticle. A substrate stage is adapted to support a substrate. A reflective optical system is adapted to image the reticle onto the substrate. The reflective optical system includes a primary mirror including a first mirror and a second mirror, and a secondary mirror. The reflective optical system has sufficient degrees of freedom for both alignment and correction of third order aberrations when projecting an image of the reticle onto the substrate by reflections off the first mirror, the secondary mirror, and the second mirror.
60 Citations
20 Claims
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1. A system, comprising:
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a reticle;
a substrate; and
a reflective optical system configured to image the reticle onto the substrate, the reflective optical system comprising a primary mirror, the primary mirror including a first mirror and a second mirror, and a secondary mirror, wherein the reflective optical system has ten (10) degrees of freedom for both alignment and correction of aberrations when projecting an image of the reticle onto the substrate by reflections off the first mirror, the secondary mirror, and the second mirror. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification