Method for decomposition of a customized DOE for use with a single exposure into a set of multiple exposures using standard DOEs with optimized exposure settings
First Claim
Patent Images
1. A method of determining diffractive optical elements to be utilized in an imaging process, said method comprising the steps of:
- defining a customized diffractive optical element which is based on a target pattern to be printed during said imaging process;
decomposing said customized diffractive optical element into one or more standard diffractive optical elements; and
defining an exposure dose to be assigned to each of said one or more standard diffractive optical elements.
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Abstract
A method of determining diffractive optical elements to be utilized in an imaging process. The method includes the steps of defining a customized diffractive optical element which is based on a target pattern to be printed during the imaging process; decomposing the customized diffractive optical element into one or more standard diffractive optical elements; and defining an exposure dose to be assigned to each of the one or more standard diffractive optical elements.
18 Citations
19 Claims
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1. A method of determining diffractive optical elements to be utilized in an imaging process, said method comprising the steps of:
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defining a customized diffractive optical element which is based on a target pattern to be printed during said imaging process;
decomposing said customized diffractive optical element into one or more standard diffractive optical elements; and
defining an exposure dose to be assigned to each of said one or more standard diffractive optical elements. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method of imaging a mask having a target pattern, said method comprising the steps of:
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defining a set of process parameters to be utilized to image said mask;
defining a customized diffractive optical element which is based on said target pattern;
decomposing said customized diffractive optical element into one or more standard diffractive optical elements;
defining an exposure dose to be assigned to each of said one or more standard diffractive optical elements, and utilizing said one or more standard diffractive optical elements when imaging said mask. - View Dependent Claims (8, 9, 10, 11, 12)
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13. A computer program product embedded in a recording medium operable for controlling a computer and directing the computer to generate files corresponding to diffractive optical elements to be utilized to image a target pattern in a lithographic imaging process, said generation of said files comprising the steps of:
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defining a customized diffractive optical element which is based on a target pattern to be printed during said imaging process;
decomposing said customized diffractive optical element into one or more standard diffractive optical elements; and
defining an exposure dose to be assigned to each of said one or more standard diffractive optical elements. - View Dependent Claims (14, 15, 16, 17, 18)
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19. A device manufacturing method comprising the steps of:
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(a) providing a substrate that is at least partially covered by a layer of radiation-sensitive material;
(b) providing a projection beam of radiation using an imaging system;
(c) generating a mask having a plurality of feature, said mask utilized to endow the projection beam with a pattern in its cross-section;
(d) projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material, wherein, in step (b), diffractive optical elements are utilized in the step of providing a projection beam, said diffractive optical elements formed by a method comprising the steps of;
defining a customized diffractive optical element which is based on a target pattern to be printed during said imaging process;
decomposing said customized diffractive optical element into one or more standard diffractive optical elements; and
defining an exposure dose to be assigned to each of said one or more standard diffractive optical elements.
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Specification