Three-dimensional pvd targets, and methods of forming three-dimensional pvd targets

• US 20070196563A1
• Filed: 11/15/2005
• Published: 08/23/2007
• Est. Priority Date: 11/18/2004
• Status: Abandoned Application

• Current Assignee: Honeywell International Inc.
• Original Assignee: Honeywell International Inc.
• Inventors: Strothers, Susan, Morales, Diana, Wuwen, Yi, Lycan, Rodger, Nolander, Ira
• Application Number:
  US11/664,358
• Publication Number:
  US 20070196563A1
• Time in Patent Office: Days
• US Class Current: 427/74
• CPC Class Codes: B22F 2201/20 Use of vacuum
• CPC Class Codes: B22F 2998/10 Processes characterised by the sequence of their steps
• CPC Class Codes: B22F 2999/00 Aspects linked to processes or compositions used in powder metallurgy
• CPC Class Codes: B22F 3/1208 Containers or coating used therefor
• CPC Class Codes: B22F 3/1258 Container manufacturing
• CPC Class Codes: B22F 3/15 Hot isostatic pressing
• CPC Class Codes: B22F 7/08 with one or more parts not made from powder B22F7/062 takes precedence
• CPC Class Codes: C23C 14/3407 Cathode assembly for sputtering apparatus, e.g. Target
• CPC Class Codes: C23C 14/3414 Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Abstract

The invention includes methods by which hot isostatic pressing is utilized to form physical vapor deposition targets. In particular aspects, the physical vapor deposition targets can contain one or more of iridium, cobalt, ruthenium, tungsten, molybdenum, titanium, aluminum and tantalum; and/or one or more of aluminides, silicides, carbides and chalcogenides. The invention also includes three-dimensional targets which include one or more of iridium, cobalt, ruthenium, tungsten molybdenum, titanium, aluminum and tantalum.

Claims

1. A method of forming a three-dimensional physical vapor deposition target, comprising:

forming a can substantially complementary to a desired three-dimensional shape of the target;

placing powdered material within the can;

subjecting the canned powder to hot isostatic pressing to form the material substantially into a physical vapor deposition target substantially having the desired three-dimensional shape; and

removing only a portion of the can from the physical vapor deposition target.

2. The method of claim 1 further comprising vacuum hot pressing of the powdered material prior to the hot isostatic pressing.

3. The method of claim 1 wherein the material comprises one or more of iridium, cobalt, ruthenium, tantalum, tungsten, chromium and molybdenum.

4. The method of claim 1 wherein the material consists essentially of one or more of iridium, cobalt, ruthenium, tantalum, tungsten, chromium and molybdenum.

5. The method of claim 1 wherein the material consists of one or more of iridium, cobalt, ruthenium, tantalum, tungsten, chromium and molybdenum.

6. The method of claim 5 wherein the can comprises at least one of aluminum, titanium and copper.

7. The method of claim 1 wherein the material consists essentially of ruthenium.

8. The method of claim 1 wherein the desired three-dimensional shape is a hollow cathode magnetron target shape.

9. The method of claim 8 wherein the removal of only some of the can leaves a portion of the can remaining against the physical vapor deposition target as a backing plate.

10. The method of claim 9 wherein the removed part of the can comprises a different composition than the portion of the can remaining against the physical vapor deposition target as the backing plate.

11. The method of claim 9 wherein the remaining portion of the can comprises titanium, and wherein the physical vapor deposition target comprises ruthenium.

12. The method of claim 8 further comprising attaching a flange to the portion of the can remaining as the backing plate.

13. The method of claim 12 wherein an entirety of the flange is attached after the hot isostatic pressing.

14. The method of claim 12 wherein the flange is attached prior to the hot isostatic pressing.

15. The method of claim 12 wherein:

the flange is attached to the portion of the can with a weld prior to the hot isostatic pressing;

an opening is provided through the welded flange, the inside of the flange is substantially evacuated through the opening, and the opening is then sealed prior to the hot isostatic pressing; and

wherein the hot isostatic pressing is utilized to improve the bonding of the flange to the portion of the can.

16. A method of forming a hollow cathode magnetron target, comprising:

forming a can substantially complementary to a desired hollow cathode magnetron target shape;

placing powdered material within the can, the powdered material comprising one or more of iridium, cobalt, ruthenium, tungsten, molybdenum, titanium, aluminum and tantalum;

subjecting the canned powder to hot isostatic pressing to form the material substantially into a physical vapor deposition target substantially having the desired hollow cathode magnetron target shape; and

removing a first portion of the can from the physical vapor deposition target while leaving a second portion of the can as a backing plate attached to the physical vapor deposition target.

17. The method of claim 16 further comprising vacuum hot pressing of the powdered material prior to the hot isostatic pressing.

18. The method of claim 16 wherein an entirety of the powdered material within the can during the hot isostatic pressing consists essentially of ruthenium.

19. The method of claim 16 wherein an entirety of the powdered material within the can during the hot isostatic pressing consists essentially of tungsten.

20. The method of claim 16 wherein an entirety of the powdered material within the can during the hot isostatic pressing consists essentially of molybdenum.

21. The method of claim 16 wherein an entirety of the powdered material within the can during the hot isostatic pressing consists essentially of tantalum.

22. The method of claim 16 wherein an entirety of the powdered material within the can during the hot isostatic pressing consists essentially of tungsten and titanium.

23. The method of claim 16 wherein an entirety of the powdered material within the can during the hot isostatic pressing consists essentially of tungsten and aluminum.

24. The method of claim 16 wherein an entirety of the powdered material within the can during the hot isostatic pressing consists essentially of tantalum and aluminum.

25. The method of claim 16 wherein the first and second portions of the can have substantially the same chemical composition as one another.

26. The method of claim 16 wherein the first and second portions of the can do not have substantially the same chemical composition as one another.

27. The method of claim 16 wherein:

the target consists essentially of a first material;

the second portion of the can comprises an outermost shell consisting essentially of a second material; and

further comprising providing a third material between the outermost shell of the can and the powder prior to the hot isostatic pressing to enhance bonding between the outermost shell and the target.

28. The method of claim 27 wherein the first material is ruthenium and the second material is titanium.

29. The method of claim 16 wherein:

the target consists essentially of a first material;

the first portion of the can comprises an outermost shell consisting essentially of a second material; and

further comprising providing a third material between the outermost shell of the can and the powder prior to the hot isostatic pressing to reduce bonding between the outermost shell and the target.

30. The method of claim 29 wherein the first material is ruthenium and the second material is titanium.

31. The method of claim 29 wherein the third material is a ceramic material.

32. (canceled)

33. (canceled)

34. A three-dimensional physical vapor deposition target comprising a composition containing one or more of iridium, ruthenium, and chalcogenide.

35. The target of claim 34 wherein at least one of the iridium and ruthenium is present as a component of an alloy.

36. The target of claim 34 having a density of at least 98% of a theoretical maximum density of the composition of the target.

37. The target of claim 34 wherein composition is crystalline and has an average crystalline grain size of less than or equal to 150 microns.

38. The target of claim 34 being a hollow cathode magnetron target.

39. The target of claim 34 comprising ruthenium.

40. The target of claim 34 consisting essentially of ruthenium.

41. The target of claim 34 consisting essentially of ruthenium and being bonded to a backing plate consisting essentially-of aluminum, titanium or copper.

42. The target of claim 41 being a hollow cathode magnetron target.

43. The target of claim 34 consisting of ruthenium.