Method for improving self-aligned silicide extendibility with spacer recess using a stand-alone recess etch integration
First Claim
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1. A method for making a silicided gate structure, comprising:
- providing a semiconductor substrate having a gate disposed thereon and having a spacer disposed adjacent to the gate;
subjecting the spacer to a recess etch which exposes a lateral portion of the gate;
creating an implant region adjacent to the spacer; and
forming a layer of silicide over the exposed lateral portion of the gate.
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Abstract
A method is provided for making a silicided gate (209). In accordance with the method, a semiconductor substrate (202) is provided which has a gate (209) disposed thereon and which has a spacer (219) disposed adjacent to the gate. The spacer is subjected to a recess etch which exposes a lateral portion of the gate. An implant region (215) is then created adjacent to the spacer, and a layer of silicide (225) is formed which extends over the exposed lateral portion of the gate.
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Citations
20 Claims
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1. A method for making a silicided gate structure, comprising:
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providing a semiconductor substrate having a gate disposed thereon and having a spacer disposed adjacent to the gate;
subjecting the spacer to a recess etch which exposes a lateral portion of the gate;
creating an implant region adjacent to the spacer; and
forming a layer of silicide over the exposed lateral portion of the gate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method for making a silicided gate structure, comprising:
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providing a semiconductor substrate having a gate disposed thereon;
depositing a conformal layer of spacer material over the gate;
subjecting the conformal layer to a first etch so as to define first and second spacer structures therein, wherein the first and second spacer structures are adjacent to the gate;
subjecting the first spacer to a second etch which exposes a first lateral portion of the gate;
creating first and second implant regions adjacent to the first and second spacers; and
forming a layer of silicide over the first lateral portion of the gate. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification