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Selection of wavelengths for integrated circuit optical metrology

  • US 20070198211A1
  • Filed: 04/20/2007
  • Published: 08/23/2007
  • Est. Priority Date: 06/03/2002
  • Status: Active Grant
First Claim
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1. A method of selecting wavelengths for use in optical metrology of an integrated circuit structure having a nominal profile, the method comprising:

  • determining one or more termination criteria;

    determining one or more selection criteria;

    creating a correlation matrix for a set of diffraction spectra measured at optical metrology measurement points, the measurement points corresponding to specified wavelengths, the correlation matrix having as matrix members correlation coefficients corresponding to the measurement points;

    selecting wavelengths using the set of diffraction spectra for the integrated circuit structure, the selection criteria, and a wavelength selection algorithm; and

    performing the selecting step until the termination criteria are met.

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