Method of manufacturing patterned film
First Claim
1. A method of manufacturing a patterned film comprising the steps of:
- (a) disposing a multilayered mask containing at least one soft mask layer formed of a soft material and at least one hard mask layer formed of a hard material on one of a substrate and an electrode formed on said substrate;
(b) spraying powder formed of a brittle material toward said substrate, on which said multilayered mask has been disposed, and allowing the powder to collide with an under layer to deposit the powder thereon, thereby forming a brittle material layer; and
(c) removing said multilayered mask after step (b).
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Accused Products
Abstract
A method of manufacturing a patterned film by which an accurately patterned film is formed when film formation is performed by using the AD method. The method includes the steps of: (a) disposing a multilayered mask containing at least one soft mask layer formed of a soft material and at least one hard mask layer formed of a hard material on a substrate or an electrode formed on the substrate; (b) spraying powder formed of a brittle material toward the substrate, on which the multilayered mask has been disposed, and allowing the powder to collide with an under layer to deposit the powder thereon, thereby forming a brittle material layer; and (c) removing the multilayered mask after step (b).
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Citations
17 Claims
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1. A method of manufacturing a patterned film comprising the steps of:
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(a) disposing a multilayered mask containing at least one soft mask layer formed of a soft material and at least one hard mask layer formed of a hard material on one of a substrate and an electrode formed on said substrate; (b) spraying powder formed of a brittle material toward said substrate, on which said multilayered mask has been disposed, and allowing the powder to collide with an under layer to deposit the powder thereon, thereby forming a brittle material layer; and (c) removing said multilayered mask after step (b). - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method of manufacturing a patterned film comprising the steps of:
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(a) disposing a mask having projection on one of a substrate and an electrode formed on said substrate; (b) spraying powder formed of a brittle material toward said substrate, on which said mask has been disposed, and allowing the powder to collide with an under layer to deposit the powder thereon, thereby forming a brittle material layer; and (c) removing said mask after step (b). - View Dependent Claims (8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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Specification