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Exposure Method and Apparatus, and Device Manufacturing Method

  • US 20070206167A1
  • Filed: 12/22/2004
  • Published: 09/06/2007
  • Est. Priority Date: 01/06/2004
  • Status: Abandoned Application
First Claim
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1. An exposure method for transferring a pattern on a mask onto a substrate by using a catadioptric projection optical system that has a plurality of partial lens barrels that hold optical systems having optical axes that extend in mutually different directions, comprising:

  • measuring an amount of rotation of said catadioptric projection optical system about an optical axis which intersects at least one of said mask and said substrate; and

    adjusting at least one of an attitude and a scan direction of at least one of said mask and said substrate based on a result of the measurement of the amount of rotation.

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