Exposure Method and Apparatus, and Device Manufacturing Method
First Claim
1. An exposure method for transferring a pattern on a mask onto a substrate by using a catadioptric projection optical system that has a plurality of partial lens barrels that hold optical systems having optical axes that extend in mutually different directions, comprising:
- measuring an amount of rotation of said catadioptric projection optical system about an optical axis which intersects at least one of said mask and said substrate; and
adjusting at least one of an attitude and a scan direction of at least one of said mask and said substrate based on a result of the measurement of the amount of rotation.
1 Assignment
0 Petitions
Accused Products
Abstract
An exposure method for transferring a pattern on a mask onto a substrate using a catadioptric projection optical system having partial lens barrels that hold optical systems having optical axes that extend in mutually different directions. The method includes measuring an amount of rotation of the catadioptric projection optical system about an optical axis intersecting at least one of the mask and the substrate; and adjusting at least one of an attitude and a scan direction of at least one of the mask and the substrate based on a measurement result of the amount of rotation. The substrate is exposed by adjusting at least one of the attitude and the scan direction of at least one of the mask and the substrate so that the rotation of the projected image on the substrate attributable to the rotation of the projection optical system is offset; thus, excellent exposure accuracy is achieved.
17 Citations
15 Claims
-
1. An exposure method for transferring a pattern on a mask onto a substrate by using a catadioptric projection optical system that has a plurality of partial lens barrels that hold optical systems having optical axes that extend in mutually different directions, comprising:
-
measuring an amount of rotation of said catadioptric projection optical system about an optical axis which intersects at least one of said mask and said substrate; and
adjusting at least one of an attitude and a scan direction of at least one of said mask and said substrate based on a result of the measurement of the amount of rotation. - View Dependent Claims (2, 3, 4, 13)
-
-
5. An exposure method for transferring a pattern on a mask onto a substrate by using a catadioptric projection optical system that has a partial lens barrel that holds an optical system having optical axes that extend in mutually different directions while scanning the mask and the substrate, comprising:
adjusting at least one of an attitude and a scan direction of at least one of said mask and said substrate in accordance with an amount of rotation of said catadioptric projection optical system about an optical axis intersecting at least one of said mask and said substrate. - View Dependent Claims (14)
-
6. An exposure apparatus which has a catadioptric projection optical system having a plurality of partial lens barrels having optical axes that extend in mutually different directions, a mask stage that holds a mask, and a substrate stage that holds a substrate, and which transfers a pattern on said mask onto said substrate via said catadioptric projection optical system, comprising:
-
a measuring device which measures an amount of rotation of said catadioptric projection optical system about an optical axis that intersects at least one of said mask and said substrate; and
a control device which adjusts at least one of an attitude and a scan direction of at least one of said mask stage and said substrate stage based on a result of the measurement of the amount of rotation. - View Dependent Claims (7, 8, 9, 10, 11, 12, 15)
-
Specification