Exposure apparatus and making method thereof

• US 20070206170A1
• Filed: 12/28/2006
• Published: 09/06/2007
• Est. Priority Date: 12/28/2005
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Ebihara, Akimitsu
• Granted Patent: US 8,953,148 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03B 27/42 for automatic sequential copying of the same original G03B27/34, G03B27/53 take precedence
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Abstract

An exposure apparatus that forms a pattern by exposing a substrate is equipped with a first platform tower, a second platform tower installed at a predetermined distance, and an exposure main section arranged within the space between both platform towers that includes a plurality of high rigidity sections each including a high rigidity component. Accordingly, it becomes possible to use a module (a high rigidity section) of the preceding generation even when the generation changes.

Claims

1. An exposure apparatus that forms a pattern by exposing a substrate, the apparatus comprising:

a first frame and a second frame installed at a predetermined distance; and

an exposure main section arranged within a space between the first frame and the second frame that includes a plurality of high rigidity sections each including a high rigidity component.

2. The exposure apparatus of claim 1 wherein

at least one of the plurality of high rigidity sections includes a plurality of high rigidity components and a connection member of a flexible structure that connects the high rigidity components.

3. The exposure apparatus claim 1 wherein

the exposure main section includes a first module including an optical system that generates a predetermined pattern as the high rigidity component and a second module including a substrate stage that moves holding the substrate as the high rigidity component.

4. The exposure apparatus of claim 3 wherein

the first module includes a frame member as the high rigidity component by which the optical system is supported by suspension via a connection member of a flexible structure.

5. The exposure apparatus of claim 3 wherein

the exposure main section further includes a third module including a mask stage that holds a mask as the high rigidity component.

6. The exposure apparatus of claim 5 wherein

the mask stage and the substrate stage are moved synchronously to form a pattern on the substrate via the mask, and the mask stage holds a plurality of masks which are lined in a direction of the synchronous movement.

7. The exposure apparatus of claim 5 wherein

the first, second and third modules have a structure that can isolate external vibration to each of the high rigidity components.

8. The exposure apparatus of claim 5, the apparatus further comprising:

an illumination unit that illuminates the mask with an illumination light, the unit including a first illumination section arranged in one frame of the first frame and the second frame and a second illumination section that optically connects to the first illumination section.

9. The exposure apparatus of claim 3, the apparatus further comprising:

a temperature adjusting unit that makes gas flow inside a first space that has a rectangular shape in a planar view between the first frame and the second frame in which a part of the optical system is placed, along a diagonal line of the rectangular shape.

10. The exposure apparatus of claim 9 wherein

the temperature adjusting unit makes the gas flow toward the optical system.

11. The exposure apparatus of claim 10 wherein

the temperature adjusting unit includes a recovery section into which the gas that has passed the periphery of the optical system flows.

12. The exposure apparatus of claim 9 wherein

the temperature adjusting unit includes a supply section that supplies gas into the first space and a recovery section into which the gas inside the first space flows, and the supply section and the recovery section are placed with the optical system in between.

13. The exposure apparatus of claim 9 wherein

the temperature adjusting unit makes gas flow inside a second space independently from the first space, between the first frame and the second frame in which the substrate stage is placed.

14. The exposure apparatus of claim 13 wherein

the temperature adjusting unit makes the gas flow in the second space by a downflow method.

15. The exposure apparatus of claim 9 wherein

in the exposure main section, a pattern is formed on the substrate via a mask, and the apparatus further comprises:

an illumination unit that illuminates the mask with an illumination light and has a part of the unit arranged in one frame of the first frame and the second frame, whereby

a part of the temperature adjusting unit is arranged in the one frame of the first frame and the second frame.

16. The exposure apparatus of claim 3, the apparatus further comprising:

a temperature adjusting unit that makes gas flow inside a first space that has a rectangular shape in a planar view between the first frame and the second frame in which a part of the optical system is placed, by a side flow method.

17. The exposure apparatus of claim 3 wherein

in the exposure main section, a pattern is formed on the substrate via a mask, and the apparatus further comprises:

an illumination unit that illuminates the mask and has a part of the unit arranged in one frame of the first frame and the second frame; and

a carrier system of the mask and/or the substrate that has at least a part of the system arranged in the other frame of the first frame and the second frame.

18. The exposure apparatus of claim 3 wherein

in the first frame and the second frame, a support section that makes a set in pairs so as to support a module other than the second module is respectively arranged.

19. The exposure apparatus of claim 18 wherein

each support section is a guide, and

the module other than the second module can be inserted from the outside along the guide into a space between the first frame and the second frame.

20. The exposure apparatus of claim 1, the apparatus further comprising:

an electric substrate rack that is arranged in at least one frame of the first frame and the second frame.

21. The exposure apparatus of claim 1 wherein

the first frame and the second frame are both a platform tower.

22. A making method of an exposure apparatus in which an exposure apparatus that forms a pattern by exposing a substrate is made, the method comprising:

a process of respectively installing a first frame and a second frame on a predetermined surface; and

a process of placing an exposure main section including a plurality of high rigidity sections distanced apart that each include a high rigidity component, in a space between the first frame and the second frame.

23. The making method of claim 22, the method further comprising:

a process of installing a base plate on the surface, on which a part of the exposure main section is placed.

24. The making method of claim 23 wherein

the first frame and the second frame are installed with the base plate in between.

25. The making method of claim 23 wherein

in the first frame and the second frame, a guide that makes a set in pairs is respectively arranged, and

the exposure main section includes a first module including an optical system that generates a predetermined pattern as the high rigidity component and a second module including a substrate stage that moves holding the substrate as the high rigidity component, whereby

in the process of placing, the first module is inserted from the outside into a space between the first frame and the second frame along a corresponding pair of guides, and the second module is placed on the base plate.

26. The making method of claim 25 wherein

the exposure main section further includes a third module including a mask stage that holds a mask as the high rigidity component, and

in the process of placing, the third module is inserted from the outside into a space between the first frame and the second frame along a corresponding pair of guides.

27. The making method of claim 26, the method further comprising:

a process of assembling an illumination unit that illuminates the mask with an illumination light by optically connecting to a first illumination section arranged in one frame of the first frame and the second frame, a second illumination section.

28. The making method of claim 27, the method further comprising:

a process of assembling into the one frame a temperature adjusting unit that makes gas flow inside the space between the first frame and the second frame.

29. The making method of claim 27, the method further comprising:

a process of assembling into the other frame of the first frame and the second frame a carrier system of the mask and/or the substrate.

30. The making of claim 22, the method further comprising:

a process of assembling an electric substrate rack that is arranged in at least one frame of the first frame and the second frame.

31. The making method of claim 22, the method further comprising:

a process of fixing a panel to each of the first frame and the second frame in a state where the space between the first frame and the second frame is covered.

32. The making method of claim 22 wherein

as the first frame and the second frame, platform towers are used.

33. An exposure apparatus the exposes a substrate with a radiation beam, the apparatus comprising:

a pair of frames installed at a predetermined distance; and

an exposure main section attached to the pair of frames, the section including a plurality of high rigidity sections that each include a high rigidity component.

34. An exposure apparatus that exposes a substrate with a radiation beam, the apparatus comprising:

a pair of frames installed at a predetermined distance; and

an exposure main section arranged in a space between the pair of frames with at least a part of the section attached to the pair of frames.

35. The exposure apparatus of claim 34 wherein

the exposure main section can have at least a part of the section withdrawn outside the space along a direction intersecting the arrangement direction of the pair of frames.

36. The exposure apparatus of claim 34 wherein

the exposure main section includes an optical system that generates a predetermined pattern.

37. The exposure apparatus of claim 36 wherein

the exposure main section includes a frame member that supports the optical system by suspension within the space.

38. The exposure apparatus of claim 34 wherein

the exposure main section includes a plurality of modules that are arranged independently within the space.

39. The exposure apparatus of claim 38 wherein

at least one of the plurality of modules can be withdrawn outside the space independently from other modules.

40. The exposure apparatus of claim 38 wherein

one of the plurality of modules includes a projection system.

41. The exposure apparatus of claim 38 wherein

one of the plurality of modules includes a substrate stage.

42. The exposure apparatus of claim 34, the apparatus comprising:

a module that has at least a part of the module arranged in one of or both of the pair of frames.

43. The exposure apparatus of claim 42 wherein

the module includes a carriage system that delivers an object between the exposure main section.

44. The exposure apparatus of claim 43 wherein

the object includes the substrate.

45. The exposure apparatus of claim 42 wherein

the module includes a gas supply section that supplies gas whose temperature is controlled into the space.