Photoelectrochemical synthesis of high density combinatorial polymer arrays

• US 20070207487A1
• Filed: 01/25/2007
• Published: 09/06/2007
• Est. Priority Date: 01/25/2006
• Status: Abandoned Application

• Current Assignee: Massachusetts Institute of Technology
• Original Assignee: Massachusetts Institute of Technology
• Inventors: Emig, Christopher, Jacobson, Joseph, Chow, Brian
• Application Number:
  US11/698,282
• Publication Number:
  US 20070207487A1
• Time in Patent Office: Days
• US Class Current: 435/6
• CPC Class Codes: B01J 19/0046 Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays synthesis methods per se C40B50/00
• CPC Class Codes: B01J 2219/00317 Microwell devices, i.e. having large numbers of wells
• CPC Class Codes: B01J 2219/00432 Photolithographic masks
• CPC Class Codes: B01J 2219/00439 using micromirror arrays
• CPC Class Codes: B01J 2219/00441 using lasers
• CPC Class Codes: B01J 2219/00448 using microlens arrays
• CPC Class Codes: B01J 2219/00527 Sheets
• CPC Class Codes: B01J 2219/00585 Parallel processes
• CPC Class Codes: B01J 2219/00596 Solid-phase processes
• CPC Class Codes: B01J 2219/00605 the compounds being directly bound or immobilised to solid supports
• CPC Class Codes: B01J 2219/00608 DNA chips
• CPC Class Codes: B01J 2219/00612 the surface being inorganic
• CPC Class Codes: B01J 2219/00621 by physical means, e.g. trenches, raised areas
• CPC Class Codes: B01J 2219/00626 Covalent
• CPC Class Codes: B01J 2219/00635 by reactive plasma treatment
• CPC Class Codes: B01J 2219/00637 by coating it with another layer
• CPC Class Codes: B01J 2219/00641 the porous medium being continuous, e.g. porous oxide substrates
• CPC Class Codes: B01J 2219/00653 the compounds being bound to electrodes embedded in or on the solid supports
• CPC Class Codes: B01J 2219/00659 Two-dimensional arrays
• CPC Class Codes: B01J 2219/00675 In-situ synthesis on the substrate
• CPC Class Codes: B01J 2219/00711 : Light-directed synthesis
• CPC Class Codes: B01J 2219/00713 : Electrochemical synthesis
• CPC Class Codes: B01J 2219/00722 : Nucleotides
• CPC Class Codes: B82Y 30/00 : Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: C12Q 1/6837 : using probe arrays or probe chips C12Q1/6874 takes precedence
• CPC Class Codes: C25B 3/00 : Electrolytic production of organic compounds
• CPC Class Codes: C40B 50/14 : Solid phase synthesis, i.e. wherein one or more library building blocks are bound to a solid support during library creation; Particular methods of cleavage from the solid support
• CPC Class Codes: C40B 60/14 : for creating libraries
• CPC Class Codes: H01L 27/148 : Charge coupled imagers individual charge coupled devices H01L29/765

Abstract

In a method for creating polymer arrays through photoelectrochemically modulated acid/base/radical generation for combinatorial synthesis, electrochemical synthesis is guided by a spatially modulated light source striking a semiconductor in an electrolyte solution. A substrate having at its surface at least one photoelectrode that is proximate to at least one molecule bearing at least one chemical functional group is provided, along with a reagent-generating chemistry co-localized with the chemical functional group and capable of generating reagents when subjected to a potential above a threshold. An input potential is then applied to the photoelectrode that exceeds the threshold in the presence of light and that does not exceed the threshold in the absence of light, causing the transfer of electrons to or from the substrate, and creating a patterned substrate. The process is repeated until a polymer array of desired size is created.

Claims

1. A method for photoelectrochemical placement of a material at a specific location on a substrate, comprising the steps of:

providing a substrate having at the substrate surface at least one photoelectrode that is proximate to at least one molecule bearing at least one chemical functional group;

providing a reagent-generating chemistry co-localized with the chemical functional group and capable of generating reagents when subjected to a potential above a threshold; and

applying an input potential to the photoelectrode to create a patterned substrate, the input potential exceeding the threshold in the presence of light and not exceeding the threshold in the absence of light.

2. The method of claim 1, wherein the chemical functional group is protected and the generated reagents are deprotecting.

3. The method of claim 1, wherein the chemical functional group is unprotected and the generated reagents are activating.

4. The method of claim 2, wherein the protected chemical functional group is located on a second parallel substrate and the reagent-generating chemistry can diffuse towards the protected chemical function group on the second substrate.

5. The method of claim 1, wherein the generated reagents promote the removal of a protecting group from the chemical functional group by another agent.

6. The method of claim 1, wherein the generated reagents promote the addition of a monomer.

7. The method of claim 1, wherein the generated reagents inhibit the removal of a protecting group from the chemical functional group by another agent.

8. The method of claim 1, wherein the generated reagents inhibit the addition of a monomer.

9. The method of claim 1, in which the photoelectrode is selected from the group consisting of a semiconductor, silicon, an organic photoconductor, titanium dioxide, dye sensitized titanium dioxide, a schottky diode, a layered structure of silicon and another semiconductor, a P-I-N diode, a P-N junction, and a P-N junction having a top layer coated with an inert metal.

10. The method of claim 1, wherein the applied input potential is selected from the group consisting of:

the peak potential of the substrate, within +/−

0.5V of the peak potential of the substrate, AC, AC and synchronized with the illumination source, pulsed, and pulsed and synchronized with the illumination source.

11. The method of claim 1, wherein the photoelectrode acts as a photoconductor that generates a potential that is approximately linearly proportional to an applied light field and is biased below the threshold.

12. The method of claim 1, wherein the photoelectrode acts as a photoconductor that is biased above the bandgap threshold potential of the substrate so that there exists sufficient energy for the electrons to overcome the bandgap when no light is applied.

13. The method of claim 1, further comprising the step of generating getters for rendering neutral the generated reagents by oppositely biasing, to the photoelectrode, one or more adjacent photoelectrodes.

14. The method of claim 13, wherein the getters spatially localize the effect of any deprotecting reagents.

15. The method of claim 14, wherein the deprotecting reagents are acids and the getters are bases, the deprotecting reagents are acids and the getters are radicals, the deprotecting reagents are bases and the getters are acids, the deprotecting reagents are radicals and the getters are acids, or the deprotecting reagents are radicals and the getters are radicals.

16. An array comprising at least one region of a material specifically placed by the method of claim 1.

17. A light-addressable potentiometric sensor comprising an array created by the method of claim 16.

18. The method of claim 1, further comprising the step of providing a porous reaction layer disposed on the substrate.

19. The method of claim 1, wherein the source of the light is a spatially addressable light source.

20. The method of claim 19, wherein the spatially addressable light source consists of one or more elements selected from the group consisting of:

digital mirror devices, OLED display, frontlit LCD display, backlit LCD display, fluorescent LCD display, LED display, and scanning light source display.

21. The method of claim 19, wherein the spatially addressable light source is temporally modulated.

22. The method of claim 1, wherein the photoelectrode is a continuous photoelectrode such that different regions of the photoelectrode may be differentially optically addressed.

23. The method of claim 22, further comprising the step of differentially optically addressing the continuous photoelectrode to create a spatial pattern of material.

24. The method of claim 1, wherein there is a one-dimensional or 2-dimensional array of photoelectrodes.

25. The method of claim 24, wherein the array of photoelectrodes are differentially optically addressed to create a spatial pattern of material.

26. The method of claim 2, further comprising the step of monitoring the generation of deprotecting agents in real-time using a pH-sensitive dye.

27. The method of claim 2, further comprising the step of monitoring the deprotection reactions in real-time using UV absorption spectroscopy.

28. The method of claim 2, further comprising the step of electrochemically monitoring the generation of deprotecting agents using the photoelectrode.

29. A method for photoelectrochemical synthesis of a polymer array, comprising the steps of:

(a) providing a substrate having at the substrate surface at least one photoelectrode that is proximate to at least one molecule bearing at least one chemical functional group;

(b) providing a reagent-generating chemistry co-localized with the chemical functional group capable of generating reagents when subjected to a potential above a threshold;

(c) applying an input potential to the photoelectrode to create a patterned substrate, the input potential exceeding the threshold in the presence of light and not exceeding the threshold in the absence of light; and

(d) repeating steps (a) to (c) until a polymer array of desired size is synthesized.

30. The method of claim 29, further comprising the step of immobilizing pre-synthesized molecules into patterns and arrays.

31. A polymer array produced by the method of claim 29.

32. A DNA array produced by the method of claim 29.

33. A method for photoelectrochemical placement of a material at a specific location on a substrate, comprising the steps of:

providing a substrate having at the substrate surface at least one photoelectrode that is proximate to at least one molecule bearing at least one chemical functional group that can be cleaved;

providing a cleaving reagent-generating chemistry co-localized with the chemical functional group that is capable of generating cleaving reagents when subjected to a potential above a threshold; and

applying an input potential to the photoelectrode to create a patterned substrate, the input potential exceeding the threshold in the presence of light and not exceeding the threshold in the absence of light.

34. The method of claim 33, wherein the cleaving agent selectively promotes the cleavage of a molecule from a surface by another agent.

35. The method of claim 33, wherein the cleaving agent selectively inhibits the cleavage of a molecule from a surface by another agent.