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Sealing device and method for a processing system

  • US 20070209590A1
  • Filed: 03/08/2006
  • Published: 09/13/2007
  • Est. Priority Date: 03/08/2006
  • Status: Active Grant
First Claim
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1. A vacuum processing system for treating a substrate, comprising:

  • a first chamber assembly comprising a first sealing surface;

    a second chamber assembly comprising a second sealing surface; and

    a sealing device coupled to and retained by one of said first sealing surface or said second sealing surface, said sealing device comprising two or more contact ridges and one or more pockets disposed therebetween, wherein a seal between said first chamber assembly and said second chamber assembly is formed by coupling said first chamber assembly to said second chamber assembly in order to facilitate contact of said two or more contact ridges of said sealing device with said second sealing surface while trapping gas between said two or more contact ridges within said pocket.

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