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EFFLUENT GAS STREAM TREATMENT SYSTEM HAVING UTILITY FOR OXIDATION TREATMENT OF SEMICONDUCTOR MANUFACTURING EFFLUENT GASES

  • US 20070212288A1
  • Filed: 05/07/2007
  • Published: 09/13/2007
  • Est. Priority Date: 12/31/1996
  • Status: Active Grant
First Claim
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1. A method for treating the effluent fluid stream from one or more semiconductor manufacturing process tools, comprising the steps of:

  • removing water soluble gases from the effluent fluid stream;

    oxidizing at least a portion of the oxidizable components of the effluent fluid stream; and

    removing acidic components from the effluent fluid stream.

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