Exposure Apparatus, Exposure Method, and Method for Producing Device
First Claim
1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate, the exposure apparatus comprising:
- a projection optical system which is provided with a plurality of elements;
a support member which supports a first element closest to an image plane of the projection optical system among the plurality of elements, in a substantially stationary state with respect to an optical axis of the projection optical system;
a first space which is formed on a side of one surface of the first element and which is filled with a liquid; and
a second space which is formed on a side of the other surface of the first element independently from the first space and which is filled with a liquid, wherein;
a liquid immersion area, with which a part of a surface of the substrate is covered, is formed with the liquid in the first space, and the substrate is exposed by radiating the exposure light beam onto the substrate through the liquid in the first space and the liquid in the second space.
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Accused Products
Abstract
An exposure apparatus includes a projection optical system having a plurality of optical elements. A first space, which is disposed on a side of a lower surface of an optical element closest to an image plane of the projection optical system, is filled with a liquid. A second space, which is disposed on a side of an upper surface of the optical element and which is independent from the first space, is filled with a liquid. An exposure light beam is radiated onto a substrate through the liquid in the first space and the liquid in the second space to expose the substrate. An optical element, which is next closest to the image plane with respect to the optical element, is prevented from any pollution with the liquid.
114 Citations
58 Claims
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1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate, the exposure apparatus comprising:
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a projection optical system which is provided with a plurality of elements;
a support member which supports a first element closest to an image plane of the projection optical system among the plurality of elements, in a substantially stationary state with respect to an optical axis of the projection optical system;
a first space which is formed on a side of one surface of the first element and which is filled with a liquid; and
a second space which is formed on a side of the other surface of the first element independently from the first space and which is filled with a liquid, wherein;
a liquid immersion area, with which a part of a surface of the substrate is covered, is formed with the liquid in the first space, and the substrate is exposed by radiating the exposure light beam onto the substrate through the liquid in the first space and the liquid in the second space. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 18, 19, 20, 21, 22, 23, 24, 25, 26, 33, 35, 36)
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17. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate, the exposure apparatus comprising:
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a projection optical system which is provided with a plurality of elements;
a first space which is formed on a side of one surface of a first element closest to an image plane of the projection optical system among the plurality of elements;
a second space which is formed on a side of the other surface of the first element;
a connecting hole which connects the first space and the second space; and
a liquid supply mechanism which supplies a liquid to one of the first space and the second space to fill the first space and the second space with the liquid via the connecting hole, wherein;
the substrate is exposed by radiating the exposure light beam onto the substrate through the liquid in the first space and the second space. - View Dependent Claims (27, 28, 29, 30, 31, 32, 34, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58)
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37. An exposure method for exposing a substrate by radiating an exposure light beam onto the substrate via a projection optical system provided with a plurality of elements, the exposure method comprising:
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providing a liquid to a first space disposed on a light-exit side of a first element closest to an image plane of the projection optical system among the plurality of elements;
supplying a liquid to a second space disposed on a light-incident side of the first element and isolated from the first space;
exposing the substrate by radiating the exposure light beam onto the substrate trough the liquid in the first space and the liquid in the second space; and
stopping the supply of the liquid to the second space in a state in which the second space is filled with the liquid during a period in which the exposure light beam is radiated onto the substrate. - View Dependent Claims (38, 39, 40, 41, 42, 43, 44, 45)
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46. An exposure method for exposing a substrate by radiating an exposure light beam onto the substrate via a projection optical system provided with a plurality of elements, the exposure method comprising:
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filling a first space and a second space with a liquid by supplying the liquid to one of the first space and the second space, the first space being formed on a side of one surface of a first element closest to an image plane of the projection optical system among the plurality of elements and the second space being communicated with the first space and formed on a side of the other surface of the first element; and
forming a liquid immersion area to cover a part of a surface of the substrate with the liquid in the first space and radiating the exposure light beam onto the substrate through the liquid in the first space and the second space to expose the substrate. - View Dependent Claims (47, 48)
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Specification